JPS5380966A - Manufacture of electrode fdr semiconductor device - Google Patents
Manufacture of electrode fdr semiconductor deviceInfo
- Publication number
- JPS5380966A JPS5380966A JP15650376A JP15650376A JPS5380966A JP S5380966 A JPS5380966 A JP S5380966A JP 15650376 A JP15650376 A JP 15650376A JP 15650376 A JP15650376 A JP 15650376A JP S5380966 A JPS5380966 A JP S5380966A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- fdr
- manufacture
- semiconductor device
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010408 film Substances 0.000 abstract 2
- 239000007772 electrode material Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To produce an electrode featuring a high performance and a high reliability by using a double film of Ti thin film and Al film for the electrode material.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15650376A JPS5380966A (en) | 1976-12-27 | 1976-12-27 | Manufacture of electrode fdr semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15650376A JPS5380966A (en) | 1976-12-27 | 1976-12-27 | Manufacture of electrode fdr semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5380966A true JPS5380966A (en) | 1978-07-17 |
Family
ID=15629174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15650376A Pending JPS5380966A (en) | 1976-12-27 | 1976-12-27 | Manufacture of electrode fdr semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5380966A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5566084U (en) * | 1978-10-30 | 1980-05-07 | ||
| JPS5583253A (en) * | 1978-12-19 | 1980-06-23 | Fujitsu Ltd | Semiconductor device |
| JPS5745228A (en) * | 1980-08-29 | 1982-03-15 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS6046024A (en) * | 1983-08-24 | 1985-03-12 | Toshiba Corp | Manufacture of semiconductor device |
| JPS60152171A (en) * | 1984-01-19 | 1985-08-10 | Kyocera Corp | Reader |
| JPS6261358A (en) * | 1985-09-11 | 1987-03-18 | Mitsubishi Electric Corp | Semiconductor device |
| JPS6271271A (en) * | 1985-09-24 | 1987-04-01 | Sharp Corp | Electrode structure of silicon carbide semiconductor |
| JPH0228955A (en) * | 1988-03-07 | 1990-01-31 | Internatl Business Mach Corp <Ibm> | Method of forming multilayer wiring |
| JPH05198790A (en) * | 1992-11-20 | 1993-08-06 | Mitsubishi Electric Corp | Semiconductor device |
-
1976
- 1976-12-27 JP JP15650376A patent/JPS5380966A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5566084U (en) * | 1978-10-30 | 1980-05-07 | ||
| JPS5583253A (en) * | 1978-12-19 | 1980-06-23 | Fujitsu Ltd | Semiconductor device |
| JPS5745228A (en) * | 1980-08-29 | 1982-03-15 | Matsushita Electric Ind Co Ltd | Manufacture of semiconductor device |
| JPS6046024A (en) * | 1983-08-24 | 1985-03-12 | Toshiba Corp | Manufacture of semiconductor device |
| JPS60152171A (en) * | 1984-01-19 | 1985-08-10 | Kyocera Corp | Reader |
| JPS6261358A (en) * | 1985-09-11 | 1987-03-18 | Mitsubishi Electric Corp | Semiconductor device |
| JPS6271271A (en) * | 1985-09-24 | 1987-04-01 | Sharp Corp | Electrode structure of silicon carbide semiconductor |
| JPH0228955A (en) * | 1988-03-07 | 1990-01-31 | Internatl Business Mach Corp <Ibm> | Method of forming multilayer wiring |
| JPH05198790A (en) * | 1992-11-20 | 1993-08-06 | Mitsubishi Electric Corp | Semiconductor device |
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