JPS538572A - Field effect type transistor - Google Patents
Field effect type transistorInfo
- Publication number
- JPS538572A JPS538572A JP8267776A JP8267776A JPS538572A JP S538572 A JPS538572 A JP S538572A JP 8267776 A JP8267776 A JP 8267776A JP 8267776 A JP8267776 A JP 8267776A JP S538572 A JPS538572 A JP S538572A
- Authority
- JP
- Japan
- Prior art keywords
- field effect
- type transistor
- effect type
- type
- laminating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Junction Field-Effect Transistors (AREA)
Abstract
PURPOSE: To reduce the high-frequency leak by laminating the n-type and p-type GaAs on a semi-insulating substrate, providing the 2nd gate electrode on p-type layer and by giving an inverse bias to PN junction.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8267776A JPS538572A (en) | 1976-07-12 | 1976-07-12 | Field effect type transistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8267776A JPS538572A (en) | 1976-07-12 | 1976-07-12 | Field effect type transistor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS538572A true JPS538572A (en) | 1978-01-26 |
Family
ID=13781034
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8267776A Pending JPS538572A (en) | 1976-07-12 | 1976-07-12 | Field effect type transistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS538572A (en) |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57211783A (en) * | 1981-06-24 | 1982-12-25 | Hitachi Ltd | Compound semiconductor device |
| JPS5875650A (en) * | 1981-10-30 | 1983-05-07 | Mikuni Plast Kk | Rotating long shaft with blades |
| JPS58148465A (en) * | 1982-02-26 | 1983-09-03 | Mitsubishi Electric Corp | Semiconductor device |
| JPS6073963U (en) * | 1983-10-27 | 1985-05-24 | 株式会社イワキ | Rotating body shaft support structure |
| JPS6141920U (en) * | 1985-07-17 | 1986-03-18 | 三国プラスチツクス株式会社 | Power transmission shaft |
| US5084744A (en) * | 1987-03-20 | 1992-01-28 | Victor Company Of Japan, Ltd. | Field effect transistor with active layer apart from guard-ring |
| JP2002016085A (en) * | 2000-06-28 | 2002-01-18 | Sumitomo Electric Ind Ltd | Junction type field effect transistor |
| JP2010062320A (en) * | 2008-09-03 | 2010-03-18 | Toshiba Corp | Semiconductor device and fabrication method for the same |
| JP2010062321A (en) * | 2008-09-03 | 2010-03-18 | Toshiba Corp | Semiconductor device and fabrication method for the same |
| US8133776B2 (en) | 2008-09-03 | 2012-03-13 | Kabushiki Kaisha Toshiba | Semiconductor device and fabrication method for the same |
-
1976
- 1976-07-12 JP JP8267776A patent/JPS538572A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57211783A (en) * | 1981-06-24 | 1982-12-25 | Hitachi Ltd | Compound semiconductor device |
| JPS5875650A (en) * | 1981-10-30 | 1983-05-07 | Mikuni Plast Kk | Rotating long shaft with blades |
| JPS58148465A (en) * | 1982-02-26 | 1983-09-03 | Mitsubishi Electric Corp | Semiconductor device |
| JPS6073963U (en) * | 1983-10-27 | 1985-05-24 | 株式会社イワキ | Rotating body shaft support structure |
| JPS6141920U (en) * | 1985-07-17 | 1986-03-18 | 三国プラスチツクス株式会社 | Power transmission shaft |
| US5084744A (en) * | 1987-03-20 | 1992-01-28 | Victor Company Of Japan, Ltd. | Field effect transistor with active layer apart from guard-ring |
| JP2002016085A (en) * | 2000-06-28 | 2002-01-18 | Sumitomo Electric Ind Ltd | Junction type field effect transistor |
| JP2010062320A (en) * | 2008-09-03 | 2010-03-18 | Toshiba Corp | Semiconductor device and fabrication method for the same |
| JP2010062321A (en) * | 2008-09-03 | 2010-03-18 | Toshiba Corp | Semiconductor device and fabrication method for the same |
| US8133776B2 (en) | 2008-09-03 | 2012-03-13 | Kabushiki Kaisha Toshiba | Semiconductor device and fabrication method for the same |
| US8445341B2 (en) | 2008-09-03 | 2013-05-21 | Kabushiki Kaisha Toshiba | Semiconductor device and fabrication method for the same |
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