JPS54100263A - Electron beam exposure device - Google Patents

Electron beam exposure device

Info

Publication number
JPS54100263A
JPS54100263A JP647978A JP647978A JPS54100263A JP S54100263 A JPS54100263 A JP S54100263A JP 647978 A JP647978 A JP 647978A JP 647978 A JP647978 A JP 647978A JP S54100263 A JPS54100263 A JP S54100263A
Authority
JP
Japan
Prior art keywords
time
irradiation
sectional area
cross
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP647978A
Other languages
Japanese (ja)
Other versions
JPS5549419B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Hitoshi Sato
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN filed Critical Jeol Ltd
Priority to JP647978A priority Critical patent/JPS54100263A/en
Publication of JPS54100263A publication Critical patent/JPS54100263A/en
Publication of JPS5549419B2 publication Critical patent/JPS5549419B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. program control

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten both the decision time and the exposure time by deciding the cross-sectional area of the beam or the length of the short side through the electric circuit and also varying the beam irradiation quantity. CONSTITUTION:Deflecting signals X1 and Y1 to decide the beam cross-sectional area are multiplied 22 and amplified 21 by electric computer 16 and via D/A conversion 20. The irradiation time is decided 18 by the multiplication signal, and the signal of irradiation optimum to the area is transmitted to data circuit 17 via A/D converter 19. Circuit 17 supplies the information of the pulse duration and interval based on the irradiation cut-off time signal given from the electric computer and then generates 17a the pulse to supply it to blanking electrode 15. Electrode 15 gives the ON/OFF control to the beam. Then the cross-sectional area of the electron beam is formed into a size equivalent to the product of deflecting signals X1 and Y1, securing irradiation onto test sample 6 with the optimum time. With this method, the pattern data quantity can be reduced greatly, and both the decision time and the exposure time can be shortened.
JP647978A 1978-01-24 1978-01-24 Electron beam exposure device Granted JPS54100263A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP647978A JPS54100263A (en) 1978-01-24 1978-01-24 Electron beam exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP647978A JPS54100263A (en) 1978-01-24 1978-01-24 Electron beam exposure device

Publications (2)

Publication Number Publication Date
JPS54100263A true JPS54100263A (en) 1979-08-07
JPS5549419B2 JPS5549419B2 (en) 1980-12-11

Family

ID=11639602

Family Applications (1)

Application Number Title Priority Date Filing Date
JP647978A Granted JPS54100263A (en) 1978-01-24 1978-01-24 Electron beam exposure device

Country Status (1)

Country Link
JP (1) JPS54100263A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS57121229A (en) * 1981-01-21 1982-07-28 Nippon Telegr & Teleph Corp <Ntt> Electron beam drawing system
JPS6489515A (en) * 1987-09-30 1989-04-04 Sharp Kk Beam exposure device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56133825A (en) * 1980-03-21 1981-10-20 Toshiba Corp Electron beam device
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS57121229A (en) * 1981-01-21 1982-07-28 Nippon Telegr & Teleph Corp <Ntt> Electron beam drawing system
JPS6489515A (en) * 1987-09-30 1989-04-04 Sharp Kk Beam exposure device

Also Published As

Publication number Publication date
JPS5549419B2 (en) 1980-12-11

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