JPS5420681A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5420681A JPS5420681A JP8512277A JP8512277A JPS5420681A JP S5420681 A JPS5420681 A JP S5420681A JP 8512277 A JP8512277 A JP 8512277A JP 8512277 A JP8512277 A JP 8512277A JP S5420681 A JPS5420681 A JP S5420681A
- Authority
- JP
- Japan
- Prior art keywords
- metal layer
- semiconductor device
- constitute
- mixed
- way
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title 1
- 239000010410 layer Substances 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 3
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 abstract 1
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Abstract
PURPOSE: To constitute a first metal layer with Al mixed with a small quantity of Si and Cu and make positive interlayer insulation at the time of forming multilayer wirings with the first metal layer wired and connected to active elements and the second metal layer crossing with this by way of insulating layer.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8512277A JPS5917853B2 (en) | 1977-07-18 | 1977-07-18 | semiconductor equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8512277A JPS5917853B2 (en) | 1977-07-18 | 1977-07-18 | semiconductor equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5420681A true JPS5420681A (en) | 1979-02-16 |
| JPS5917853B2 JPS5917853B2 (en) | 1984-04-24 |
Family
ID=13849819
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8512277A Expired JPS5917853B2 (en) | 1977-07-18 | 1977-07-18 | semiconductor equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5917853B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59194467A (en) * | 1983-04-20 | 1984-11-05 | Toshiba Corp | Wiring material of semiconductor device |
| US4625228A (en) * | 1983-11-30 | 1986-11-25 | W.C. Heraeus Gmbh | Multi-layer electrical support substrate |
| JPH0228955A (en) * | 1988-03-07 | 1990-01-31 | Internatl Business Mach Corp <Ibm> | Method of forming multilayer wiring |
| JPH02297936A (en) * | 1989-05-12 | 1990-12-10 | Oki Electric Ind Co Ltd | Wiring aluminum alloy material of semiconductor device |
| JPH02297937A (en) * | 1989-05-12 | 1990-12-10 | Oki Electric Ind Co Ltd | Wiring aluminum alloy material of semiconductor device |
-
1977
- 1977-07-18 JP JP8512277A patent/JPS5917853B2/en not_active Expired
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59194467A (en) * | 1983-04-20 | 1984-11-05 | Toshiba Corp | Wiring material of semiconductor device |
| US4625228A (en) * | 1983-11-30 | 1986-11-25 | W.C. Heraeus Gmbh | Multi-layer electrical support substrate |
| JPH0228955A (en) * | 1988-03-07 | 1990-01-31 | Internatl Business Mach Corp <Ibm> | Method of forming multilayer wiring |
| JPH02297936A (en) * | 1989-05-12 | 1990-12-10 | Oki Electric Ind Co Ltd | Wiring aluminum alloy material of semiconductor device |
| JPH02297937A (en) * | 1989-05-12 | 1990-12-10 | Oki Electric Ind Co Ltd | Wiring aluminum alloy material of semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5917853B2 (en) | 1984-04-24 |
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