JPS5432984A - Integrated circuit device - Google Patents

Integrated circuit device

Info

Publication number
JPS5432984A
JPS5432984A JP9866477A JP9866477A JPS5432984A JP S5432984 A JPS5432984 A JP S5432984A JP 9866477 A JP9866477 A JP 9866477A JP 9866477 A JP9866477 A JP 9866477A JP S5432984 A JPS5432984 A JP S5432984A
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit device
oxidizing
insulator
poly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9866477A
Other languages
Japanese (ja)
Inventor
Hisao Nakajima
Hisayuki Higuchi
Akira Shintani
Masao Kawamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9866477A priority Critical patent/JPS5432984A/en
Publication of JPS5432984A publication Critical patent/JPS5432984A/en
Pending legal-status Critical Current

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  • Element Separation (AREA)

Abstract

PURPOSE: To manufacture an element insulation layer by filling a groove, whose flank except its bottom is surrounded with an insulator, with Si or poly Si and by oxidizing it.
COPYRIGHT: (C)1979,JPO&Japio
JP9866477A 1977-08-19 1977-08-19 Integrated circuit device Pending JPS5432984A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9866477A JPS5432984A (en) 1977-08-19 1977-08-19 Integrated circuit device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9866477A JPS5432984A (en) 1977-08-19 1977-08-19 Integrated circuit device

Publications (1)

Publication Number Publication Date
JPS5432984A true JPS5432984A (en) 1979-03-10

Family

ID=14225768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9866477A Pending JPS5432984A (en) 1977-08-19 1977-08-19 Integrated circuit device

Country Status (1)

Country Link
JP (1) JPS5432984A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58182A (en) * 1981-06-25 1983-01-05 Seiko Epson Corp semiconductor equipment
JPS58142540A (en) * 1982-02-19 1983-08-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58168260A (en) * 1982-03-30 1983-10-04 Nippon Telegr & Teleph Corp <Ntt> Semiconductor integrated circuit device and manufacture thereof
JPS598351A (en) * 1982-06-30 1984-01-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming insulating region on semiconductor substrate
US4470062A (en) * 1979-08-31 1984-09-04 Hitachi, Ltd. Semiconductor device having isolation regions
JPS60161631A (en) * 1984-02-01 1985-08-23 Hitachi Ltd Semiconductor device
JPS60208843A (en) * 1984-04-03 1985-10-21 Fujitsu Ltd Manufacture of semiconductor device
JPS60218854A (en) * 1984-04-13 1985-11-01 Nec Corp Element isolating method of semiconductor device
JPS6257232A (en) * 1985-09-05 1987-03-12 イ−ストマン　コダツク　カンパニ− Isolation device and making thereof
JPS63141346A (en) * 1986-12-03 1988-06-13 Sony Corp Manufacture of semiconductor device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4470062A (en) * 1979-08-31 1984-09-04 Hitachi, Ltd. Semiconductor device having isolation regions
JPS58182A (en) * 1981-06-25 1983-01-05 Seiko Epson Corp semiconductor equipment
JPS58142540A (en) * 1982-02-19 1983-08-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS58168260A (en) * 1982-03-30 1983-10-04 Nippon Telegr & Teleph Corp <Ntt> Semiconductor integrated circuit device and manufacture thereof
JPS598351A (en) * 1982-06-30 1984-01-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of forming insulating region on semiconductor substrate
JPS60161631A (en) * 1984-02-01 1985-08-23 Hitachi Ltd Semiconductor device
JPS60208843A (en) * 1984-04-03 1985-10-21 Fujitsu Ltd Manufacture of semiconductor device
JPS60218854A (en) * 1984-04-13 1985-11-01 Nec Corp Element isolating method of semiconductor device
JPS6257232A (en) * 1985-09-05 1987-03-12 イ−ストマン　コダツク　カンパニ− Isolation device and making thereof
JPS63141346A (en) * 1986-12-03 1988-06-13 Sony Corp Manufacture of semiconductor device

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