JPS5433879A - Boron film forming process - Google Patents

Boron film forming process

Info

Publication number
JPS5433879A
JPS5433879A JP10075677A JP10075677A JPS5433879A JP S5433879 A JPS5433879 A JP S5433879A JP 10075677 A JP10075677 A JP 10075677A JP 10075677 A JP10075677 A JP 10075677A JP S5433879 A JPS5433879 A JP S5433879A
Authority
JP
Japan
Prior art keywords
boron
film forming
forming process
boron film
adhere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10075677A
Other languages
Japanese (ja)
Other versions
JPS5817257B2 (en
Inventor
Masaki Aoki
Hiroshi Yamazoe
Masahiro Nagasawa
Koichi Azuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP10075677A priority Critical patent/JPS5817257B2/en
Publication of JPS5433879A publication Critical patent/JPS5433879A/en
Publication of JPS5817257B2 publication Critical patent/JPS5817257B2/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28—Deposition of only one other non-metal element

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide the subject process comprising the steps of : causing a boron to adhere onto a substrate at a predetermined thickness by a plasma chemical evaporating process, and thereafter causing boron to adhere thereon by an ordinary pressure chemical evaporating process, thereby obtaining a boron film excellent in film quality and mechanical property (elastic modulus) with good productivity.
JP10075677A 1977-08-22 1977-08-22 Boron film formation method Expired JPS5817257B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10075677A JPS5817257B2 (en) 1977-08-22 1977-08-22 Boron film formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10075677A JPS5817257B2 (en) 1977-08-22 1977-08-22 Boron film formation method

Publications (2)

Publication Number Publication Date
JPS5433879A true JPS5433879A (en) 1979-03-12
JPS5817257B2 JPS5817257B2 (en) 1983-04-06

Family

ID=14282352

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10075677A Expired JPS5817257B2 (en) 1977-08-22 1977-08-22 Boron film formation method

Country Status (1)

Country Link
JP (1) JPS5817257B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766747A (en) * 1991-03-11 1998-06-16 Regents Of The University Of Califonia Magnetron sputtered boron films

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58139846A (en) * 1982-02-12 1983-08-19 Kokusan Kinzoku Kogyo Co Ltd Safety device of steering lock

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5766747A (en) * 1991-03-11 1998-06-16 Regents Of The University Of Califonia Magnetron sputtered boron films

Also Published As

Publication number Publication date
JPS5817257B2 (en) 1983-04-06

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