JPS5459956A - Orientation treating method of liquid crystal cell substrates - Google Patents
Orientation treating method of liquid crystal cell substratesInfo
- Publication number
- JPS5459956A JPS5459956A JP12617378A JP12617378A JPS5459956A JP S5459956 A JPS5459956 A JP S5459956A JP 12617378 A JP12617378 A JP 12617378A JP 12617378 A JP12617378 A JP 12617378A JP S5459956 A JPS5459956 A JP S5459956A
- Authority
- JP
- Japan
- Prior art keywords
- vapor
- vapor deposition
- liquid crystal
- rotator
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 3
- 210000002858 crystal cell Anatomy 0.000 title abstract 2
- 238000007740 vapor deposition Methods 0.000 abstract 5
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000003252 repetitive effect Effects 0.000 abstract 1
Landscapes
- Liquid Crystal (AREA)
Abstract
PURPOSE: To make the pretilt angle of liquid crystal molecules close to 0° and obviate the occurrence of reverse tilt at the voltage application by evaporating an orientation treatment material onto the substrate surfaces from specific two directions simultaneously or repeatedly alternately.
CONSTITUTION: Substrates 43 of liquid crystal cells with their orientation treatment sides being faced outside are mounted to a rotator 42 which rotates about a rotating axis 14. A mask plate 44 which defines the angle of vapor deposition is provided between a vapor source 47 which produces vapor currents 48 and the rotator 42. This plate 44 is formed with a first vapor deposition hole 45 being in the direction inclined 80° from the normal of the substrate 43 and a second vapor deposition hole 46 being in the normal direction. Out of the vapor currents 48, only those which have passed through the holes 45, 46 deposit on the substrates 43 at the vapor deposition angle within a fixed range. As the rotator 42 rotates, the first and second vapor depositions take place alternately. Thereby, the repetitive stability of orientation characteristics in volume production is improved
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12617378A JPS5459956A (en) | 1978-10-16 | 1978-10-16 | Orientation treating method of liquid crystal cell substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12617378A JPS5459956A (en) | 1978-10-16 | 1978-10-16 | Orientation treating method of liquid crystal cell substrates |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9669877A Division JPS5430860A (en) | 1977-04-20 | 1977-08-12 | Method and apparatus for orientation treatment of liquid crystal cell substrates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5459956A true JPS5459956A (en) | 1979-05-15 |
Family
ID=14928478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12617378A Pending JPS5459956A (en) | 1978-10-16 | 1978-10-16 | Orientation treating method of liquid crystal cell substrates |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5459956A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006330656A (en) * | 2005-04-25 | 2006-12-07 | Showa Shinku:Kk | Vacuum deposition apparatus for liquid crystal alignment film and film forming method thereof |
-
1978
- 1978-10-16 JP JP12617378A patent/JPS5459956A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006330656A (en) * | 2005-04-25 | 2006-12-07 | Showa Shinku:Kk | Vacuum deposition apparatus for liquid crystal alignment film and film forming method thereof |
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