JPS5538566A - Orientation method of liquid crystal cell substrate - Google Patents
Orientation method of liquid crystal cell substrateInfo
- Publication number
- JPS5538566A JPS5538566A JP11254278A JP11254278A JPS5538566A JP S5538566 A JPS5538566 A JP S5538566A JP 11254278 A JP11254278 A JP 11254278A JP 11254278 A JP11254278 A JP 11254278A JP S5538566 A JPS5538566 A JP S5538566A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- range
- substrates
- angle
- angles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 210000002858 crystal cell Anatomy 0.000 title abstract 2
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 2
- 238000007740 vapor deposition Methods 0.000 abstract 8
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
Landscapes
- Liquid Crystal (AREA)
Abstract
PURPOSE: To obtain liquid crystal cells of uniform quality in multiple and simultaneous processing in mass production process, by forming oriented layers by vapor deposition at vapor deposition angles being not constant but distributed in a proper range.
CONSTITUTION: Plural substrate 63 are supported on a rotating body 72 which rotates about a rotary shaft 61, with the side to form oriented layer directed to the outside. Vapor flow 66 created in a vapor source 64 enters the substrates 63 at angles distributed in angle range difined by a mask member 67 to form oriented layers. The range of vapor deposition angles is defined by the size and position of the hole 68 provided in the member 67. Namely, the end part 69a of the hole 68 corresponds to vapor deposition angle α1, and the end part 69b to vapor deposition angle α2. When evaporating, the rotating body 62 continuously rotates, and all the substrates 63 are set in the same vapor deposition conditions, and vapor deposition is performed at each point of all substrates 63 at the vapor deposition angle α continuously distributing in the defined range, i.e., α1≥α≥α2.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11254278A JPS5538566A (en) | 1978-09-13 | 1978-09-13 | Orientation method of liquid crystal cell substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11254278A JPS5538566A (en) | 1978-09-13 | 1978-09-13 | Orientation method of liquid crystal cell substrate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5538566A true JPS5538566A (en) | 1980-03-18 |
Family
ID=14589245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11254278A Pending JPS5538566A (en) | 1978-09-13 | 1978-09-13 | Orientation method of liquid crystal cell substrate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5538566A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5069533A (en) * | 1988-06-29 | 1991-12-03 | Idemitsu Kosan Co., Ltd. | Method of orienting liquid crystal optical device |
-
1978
- 1978-09-13 JP JP11254278A patent/JPS5538566A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5069533A (en) * | 1988-06-29 | 1991-12-03 | Idemitsu Kosan Co., Ltd. | Method of orienting liquid crystal optical device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS57141930A (en) | Device for formation of thin film | |
| GB1393496A (en) | Vacuum plant for the deposition of layer | |
| AU3616297A (en) | Capped porous thin films | |
| JPS5619030A (en) | Production of liquid crystal display element | |
| JPS56137330A (en) | Orientation treatment of liquid crystal cell substrate | |
| JPS5462984A (en) | Masking deposition method | |
| JPS5459956A (en) | Orientation treating method of liquid crystal cell substrates | |
| JPS6428371A (en) | Substrate turning mechanism | |
| JPS6473075A (en) | Film forming device by ion beam sputtering | |
| JPS55129315A (en) | Production of liquid crystal display element | |
| JPS5511407A (en) | Transporter | |
| JPS5623269A (en) | Formation of thin film | |
| JPS5620162A (en) | Vapor depositing method | |
| JPS57101666A (en) | Apparatus for preparing vapor deposition film | |
| JPS6475677A (en) | Film forming device | |
| JPS54141391A (en) | Manufacture of metallized film | |
| JPS552720A (en) | Rotary coating unit for resist | |
| JPS5395884A (en) | Evaporating method and apparatus | |
| JPS5591971A (en) | Thin film forming method | |
| JPS5435176A (en) | Depositing method by vacuum evaporation | |
| JPS57132543A (en) | Horizontal type reaction tube with rotary type sample holding and heating table | |
| JPS55125269A (en) | Boat for metallizing | |
| JPS533168A (en) | Semiconductor evaporating apparatus | |
| JPS5472246A (en) | Device for coating uniformly body of revolution | |
| JPS5518159A (en) | Frequency control method for surface wave device |