JPS5477573A - Operating method of plasma treating apparatus - Google Patents

Operating method of plasma treating apparatus

Info

Publication number
JPS5477573A
JPS5477573A JP13509177A JP13509177A JPS5477573A JP S5477573 A JPS5477573 A JP S5477573A JP 13509177 A JP13509177 A JP 13509177A JP 13509177 A JP13509177 A JP 13509177A JP S5477573 A JPS5477573 A JP S5477573A
Authority
JP
Japan
Prior art keywords
gas
etching
less
action
neglible
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13509177A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6214936B2 (fr
Inventor
Tadayoshi Mifune
Yasuaki Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP13509177A priority Critical patent/JPS5477573A/ja
Publication of JPS5477573A publication Critical patent/JPS5477573A/ja
Publication of JPS6214936B2 publication Critical patent/JPS6214936B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP13509177A 1977-11-10 1977-11-10 Operating method of plasma treating apparatus Granted JPS5477573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13509177A JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13509177A JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Publications (2)

Publication Number Publication Date
JPS5477573A true JPS5477573A (en) 1979-06-21
JPS6214936B2 JPS6214936B2 (fr) 1987-04-04

Family

ID=15143617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13509177A Granted JPS5477573A (en) 1977-11-10 1977-11-10 Operating method of plasma treating apparatus

Country Status (1)

Country Link
JP (1) JPS5477573A (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727024A (en) * 1980-07-25 1982-02-13 Mitsubishi Electric Corp Washing of reactor for plasma cvd method
JPS63129630A (ja) * 1986-11-20 1988-06-02 Fuji Electric Co Ltd プラズマｃｖｄ薄膜形成法
JPH01102921A (ja) * 1987-10-16 1989-04-20 Semiconductor Energy Lab Co Ltd 被膜作製方法
JP2007294279A (ja) * 2006-04-26 2007-11-08 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117071A (en) * 1976-03-29 1977-10-01 Hitachi Ltd Self-cleaning type preparation of semiconductor

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52117071A (en) * 1976-03-29 1977-10-01 Hitachi Ltd Self-cleaning type preparation of semiconductor

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5727024A (en) * 1980-07-25 1982-02-13 Mitsubishi Electric Corp Washing of reactor for plasma cvd method
JPS63129630A (ja) * 1986-11-20 1988-06-02 Fuji Electric Co Ltd プラズマｃｖｄ薄膜形成法
JPH01102921A (ja) * 1987-10-16 1989-04-20 Semiconductor Energy Lab Co Ltd 被膜作製方法
JP2007294279A (ja) * 2006-04-26 2007-11-08 Matsushita Electric Ind Co Ltd プラズマ処理装置およびプラズマ処理方法

Also Published As

Publication number Publication date
JPS6214936B2 (fr) 1987-04-04

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