JPS5486281A - Electron-beam measuring instrument - Google Patents

Electron-beam measuring instrument

Info

Publication number
JPS5486281A
JPS5486281A JP15409277A JP15409277A JPS5486281A JP S5486281 A JPS5486281 A JP S5486281A JP 15409277 A JP15409277 A JP 15409277A JP 15409277 A JP15409277 A JP 15409277A JP S5486281 A JPS5486281 A JP S5486281A
Authority
JP
Japan
Prior art keywords
edge
detector
electron
ammeter
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15409277A
Other languages
Japanese (ja)
Other versions
JPS584314B2 (en
Inventor
Tadahiro Takigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP52154092A priority Critical patent/JPS584314B2/en
Publication of JPS5486281A publication Critical patent/JPS5486281A/en
Publication of JPS584314B2 publication Critical patent/JPS584314B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Measurement Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To improve focusing accuracy by combining a method for measurements of electron-beam intensity distribution with a sharp detector with good linearity which uses a singlecrystal of Si or Ge and takes the crystal cleavage surface as its edge.
CONSTITUTION: Electron beam detector 5 is formed of a single crystal of Si or Ge, and its crystal cleavage surface is used as the edge of detector 5. Namely, the (100) surface of the crystal is regarded as the main surface and used for the edge, or the (111) surface is regarded as the main surface for cutting at approximate 60° and used for the edge. Next, detector 5 connected to ammeter 6 grounded is fitted onto Faraday cup 3 fitted with ammeter 4 grounded as well via the insulation layer and a measured object to be exposed to electron beams is also arranged on cup 3 at the same height. In this way, cut 3 is irradiated with deflection-controlled electron beams and ammeter 4 measures a beam current.
COPYRIGHT: (C)1979,JPO&Japio
JP52154092A 1977-12-21 1977-12-21 Electron beam measuring device Expired JPS584314B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP52154092A JPS584314B2 (en) 1977-12-21 1977-12-21 Electron beam measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP52154092A JPS584314B2 (en) 1977-12-21 1977-12-21 Electron beam measuring device

Publications (2)

Publication Number Publication Date
JPS5486281A true JPS5486281A (en) 1979-07-09
JPS584314B2 JPS584314B2 (en) 1983-01-25

Family

ID=15576719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP52154092A Expired JPS584314B2 (en) 1977-12-21 1977-12-21 Electron beam measuring device

Country Status (1)

Country Link
JP (1) JPS584314B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5587071A (en) * 1978-12-26 1980-07-01 Nippon Telegr & Teleph Corp <Ntt> Measuring unit of electron beam density distribution and its measuring method
JPH02263191A (en) * 1989-04-03 1990-10-25 Sumitomo Heavy Ind Ltd Beam advance direction measuring instrument
JP2008536268A (en) * 2005-04-01 2008-09-04 アクセリス テクノロジーズ インコーポレーテッド Measuring method of beam angle
CN102435128A (en) * 2011-09-01 2012-05-02 上海显恒光电科技股份有限公司 Electron beam spot size measuring device with double Faraday cups and measuring method thereof
CN111722263A (en) * 2020-06-15 2020-09-29 电子科技大学 A Faraday Cup Design for High Power Electron Beam Spot Measurement

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02110414U (en) * 1989-02-20 1990-09-04

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5587071A (en) * 1978-12-26 1980-07-01 Nippon Telegr & Teleph Corp <Ntt> Measuring unit of electron beam density distribution and its measuring method
JPH02263191A (en) * 1989-04-03 1990-10-25 Sumitomo Heavy Ind Ltd Beam advance direction measuring instrument
JP2008536268A (en) * 2005-04-01 2008-09-04 アクセリス テクノロジーズ インコーポレーテッド Measuring method of beam angle
CN102435128A (en) * 2011-09-01 2012-05-02 上海显恒光电科技股份有限公司 Electron beam spot size measuring device with double Faraday cups and measuring method thereof
CN111722263A (en) * 2020-06-15 2020-09-29 电子科技大学 A Faraday Cup Design for High Power Electron Beam Spot Measurement
CN111722263B (en) * 2020-06-15 2022-08-23 电子科技大学 Faraday cup design for high-power electron beam spot measurement

Also Published As

Publication number Publication date
JPS584314B2 (en) 1983-01-25

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