JPS564080A - Intensity distribution measuring method of rectangular electron beam - Google Patents
Intensity distribution measuring method of rectangular electron beamInfo
- Publication number
- JPS564080A JPS564080A JP8036279A JP8036279A JPS564080A JP S564080 A JPS564080 A JP S564080A JP 8036279 A JP8036279 A JP 8036279A JP 8036279 A JP8036279 A JP 8036279A JP S564080 A JPS564080 A JP S564080A
- Authority
- JP
- Japan
- Prior art keywords
- intensity distribution
- mark
- electron beam
- rectangular
- measuring method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 abstract 2
- 238000005259 measurement Methods 0.000 abstract 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 abstract 2
- 238000001514 detection method Methods 0.000 abstract 1
- 229910001385 heavy metal Inorganic materials 0.000 abstract 1
- 229910052763 palladium Inorganic materials 0.000 abstract 1
- 229910052697 platinum Inorganic materials 0.000 abstract 1
- 229920001296 polysiloxane Polymers 0.000 abstract 1
Landscapes
- Measurement Of Radiation (AREA)
Abstract
PURPOSE: To make possible the intensity distribution measurement of the beam without differential processing of the signal by scanning detection of the rectangular electron beam through a thin mark.
CONSTITUTION: Heavy metal such as platinum palladium is evaporated in a slender cross on the silicone wafer 5 or the like to form a mark. As the rectangular electronic beam EB irradiated on the wafer 5 is crossing the mark 6, it is reflected from the mark 6 according to the intensity distribution of the beam EB. Detecting the reflected electron beam from the mark 6 enables the measurement of the intensity distribution with less effect of noise of the rectangular beam without differential processing.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8036279A JPS564080A (en) | 1979-06-26 | 1979-06-26 | Intensity distribution measuring method of rectangular electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8036279A JPS564080A (en) | 1979-06-26 | 1979-06-26 | Intensity distribution measuring method of rectangular electron beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS564080A true JPS564080A (en) | 1981-01-16 |
Family
ID=13716139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8036279A Pending JPS564080A (en) | 1979-06-26 | 1979-06-26 | Intensity distribution measuring method of rectangular electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS564080A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE48555E1 (en) | 2014-05-13 | 2021-05-18 | Berry Film Products Company, Inc. | Breathable and microporous thin thermoplastic film |
-
1979
- 1979-06-26 JP JP8036279A patent/JPS564080A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USRE48555E1 (en) | 2014-05-13 | 2021-05-18 | Berry Film Products Company, Inc. | Breathable and microporous thin thermoplastic film |
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