JPS5499562A - Device for evaporating via electron beam for vacuum deposition - Google Patents

Device for evaporating via electron beam for vacuum deposition

Info

Publication number
JPS5499562A
JPS5499562A JP14324578A JP14324578A JPS5499562A JP S5499562 A JPS5499562 A JP S5499562A JP 14324578 A JP14324578 A JP 14324578A JP 14324578 A JP14324578 A JP 14324578A JP S5499562 A JPS5499562 A JP S5499562A
Authority
JP
Japan
Prior art keywords
electron beam
vacuum deposition
via electron
evaporating
evaporating via
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14324578A
Other languages
English (en)
Japanese (ja)
Inventor
Zoringaa Eerihi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of JPS5499562A publication Critical patent/JPS5499562A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/023—Means for mechanically adjusting components not otherwise provided for
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S159/00—Concentrating evaporators
    • Y10S159/26—Electric field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP14324578A 1977-11-22 1978-11-20 Device for evaporating via electron beam for vacuum deposition Pending JPS5499562A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1423577A CH624435A5 (2) 1977-11-22 1977-11-22

Publications (1)

Publication Number Publication Date
JPS5499562A true JPS5499562A (en) 1979-08-06

Family

ID=4399104

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14324578A Pending JPS5499562A (en) 1977-11-22 1978-11-20 Device for evaporating via electron beam for vacuum deposition

Country Status (8)

Country Link
US (1) US4221629A (2)
JP (1) JPS5499562A (2)
CH (1) CH624435A5 (2)
DE (1) DE2849933C2 (2)
FR (1) FR2409596A1 (2)
GB (1) GB2008849B (2)
IT (1) IT1101171B (2)
NL (1) NL7800612A (2)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH663037A5 (de) * 1985-02-05 1987-11-13 Balzers Hochvakuum Dampfquelle fuer vakuumbeschichtungsanlagen.
US20050020368A1 (en) * 1998-04-15 2005-01-27 Burkholder Roy A. Bowling lane advertising and method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE553562A (2) * 1955-12-20 1900-01-01
US3202794A (en) * 1963-02-18 1965-08-24 Thermionics Lab Inc Permanent magnet transverse electron beam evaporation source
US3277865A (en) * 1963-04-01 1966-10-11 United States Steel Corp Metal-vapor source with heated reflecting shield
US3389210A (en) * 1965-03-29 1968-06-18 Everette M. Whitson Multiple crucible for a permanent magnet transverse electron beam evaporation source
DE1521252B2 (de) * 1966-05-03 1969-10-30 Farbenfabriken Bayer Aktiengesellschaft, 5090 Leverkusen Vorrichtung zum Verdampfen von hochschmelzenden Materialien wie Quarz od. dgl., insbesondere zum Aufdampfen von Schichten
BE754553A (fr) * 1969-08-13 1971-01-18 Leybold Heraeus Verwaltung Procede et dispositif d'evaporation sous vide de corps non metalliques a point de fusion eleve
US3582529A (en) * 1969-09-24 1971-06-01 Air Reduction Electron beam heating apparatus and control system therein
GB1340701A (en) * 1971-04-19 1973-12-12 Craswell K B Apparatus for use in coating a body with an evaporant

Also Published As

Publication number Publication date
NL7800612A (nl) 1979-05-25
IT7829838A0 (it) 1978-11-16
FR2409596A1 (fr) 1979-06-15
GB2008849A (en) 1979-06-06
FR2409596B1 (2) 1983-12-09
GB2008849B (en) 1982-03-10
US4221629A (en) 1980-09-09
IT1101171B (it) 1985-09-28
DE2849933A1 (de) 1979-05-23
CH624435A5 (2) 1981-07-31
DE2849933C2 (de) 1983-01-20

Similar Documents

Publication Publication Date Title
JPS53136798A (en) Ion beam bombardment device
JPS54109082A (en) Improvement for vacuum evaporation or the like
DE3060403D1 (en) Detector for an electron microscope
JPS53136799A (en) Ion beam bombardment device
JPS5487684A (en) Vacuum evaporation method
GB2011125B (en) Apparatus for electron beam lithograhy
JPS55152178A (en) Evaporator for vacuum vapor depositing apparatus
JPS5246384A (en) Vacuum evaporation apparatus employing electron beam
GB2000813B (en) Vacuum vapour deposition plant
JPS5373064A (en) Device for deflecting electron beam
JPS528596A (en) Electron beam vacuum machining device
JPS56107455A (en) Device for affecting electron beam
JPS5429981A (en) Device for radiating electron beam
JPS5466344A (en) Apparatus for keeping ion bombarding apparatus under evacuated condition
JPS55133738A (en) Device for moving electron beam
JPS5499562A (en) Device for evaporating via electron beam for vacuum deposition
JPS53124078A (en) Electron beam device
GB1544227A (en) Vacuum plant for example vacuum vapour deposition plant
JPS5638757A (en) Electron beam device
JPS5435680A (en) Device for exposing electron beam
JPS55161327A (en) Cathode protecting unit for electron beam device
GB2032684B (en) Electron beam aperture device
JPS53124180A (en) Crucible for vacuum evaporation
JPS53108044A (en) Evaporation source for vacuum evaporation
JPS5321089A (en) Vacuum evaporation process for nonsublimable compound