JPS55100545A - Rotary coating method and rotary coating apparatus - Google Patents
Rotary coating method and rotary coating apparatusInfo
- Publication number
- JPS55100545A JPS55100545A JP836279A JP836279A JPS55100545A JP S55100545 A JPS55100545 A JP S55100545A JP 836279 A JP836279 A JP 836279A JP 836279 A JP836279 A JP 836279A JP S55100545 A JPS55100545 A JP S55100545A
- Authority
- JP
- Japan
- Prior art keywords
- spouting
- sample
- stand
- gas
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To form a uniform film on a sample all over the surface by spouting gas from specified directions to apply it to the sample surface. CONSTITUTION:Gas spouting unit 35 provided with many gas spouting nozzles 41 whose gas spouting angle theta is 30-70 deg. to sample mounting face 34 is set at an upper portion of sample stand 31. Unit 35 is composed of first and fourth spouting sections 37, 40 whose gas spouting direction coincides with the direction of the axis of rotation of stand 31, second spouting section 38 whose gas spouting direction gives force in the same direction as rotating direction (a) of stand 31, and third spouting section 39 whose gas spouting direction gives force in the opposite direction to direction (a). Sample 32 such as wafer is mounted on stand 31 by vacuum adsorption, an adequate amt. of a photoresist is dropped onto the sample 32 surface, and stand 31 is rotated while spraying N2 gas from unit 35. The resulting photoresist film becomes thicker at the relatively wide recess of sample 32 compared to the protrusion, so the film is made uniform as a whole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP836279A JPS55100545A (en) | 1979-01-26 | 1979-01-26 | Rotary coating method and rotary coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP836279A JPS55100545A (en) | 1979-01-26 | 1979-01-26 | Rotary coating method and rotary coating apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55100545A true JPS55100545A (en) | 1980-07-31 |
Family
ID=11691111
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP836279A Pending JPS55100545A (en) | 1979-01-26 | 1979-01-26 | Rotary coating method and rotary coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55100545A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6197923A (en) * | 1984-10-19 | 1986-05-16 | Matsushita Electric Ind Co Ltd | Method and apparatus for manufacturing semiconductor device |
| JPS6395626A (en) * | 1986-10-13 | 1988-04-26 | Toshiba Corp | Applying device of resist |
-
1979
- 1979-01-26 JP JP836279A patent/JPS55100545A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6197923A (en) * | 1984-10-19 | 1986-05-16 | Matsushita Electric Ind Co Ltd | Method and apparatus for manufacturing semiconductor device |
| JPS6395626A (en) * | 1986-10-13 | 1988-04-26 | Toshiba Corp | Applying device of resist |
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