JPS55100545A - Rotary coating method and rotary coating apparatus - Google Patents

Rotary coating method and rotary coating apparatus

Info

Publication number
JPS55100545A
JPS55100545A JP836279A JP836279A JPS55100545A JP S55100545 A JPS55100545 A JP S55100545A JP 836279 A JP836279 A JP 836279A JP 836279 A JP836279 A JP 836279A JP S55100545 A JPS55100545 A JP S55100545A
Authority
JP
Japan
Prior art keywords
spouting
sample
stand
gas
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP836279A
Other languages
English (en)
Inventor
Hideaki Shimoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP836279A priority Critical patent/JPS55100545A/ja
Publication of JPS55100545A publication Critical patent/JPS55100545A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP836279A 1979-01-26 1979-01-26 Rotary coating method and rotary coating apparatus Pending JPS55100545A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP836279A JPS55100545A (en) 1979-01-26 1979-01-26 Rotary coating method and rotary coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP836279A JPS55100545A (en) 1979-01-26 1979-01-26 Rotary coating method and rotary coating apparatus

Publications (1)

Publication Number Publication Date
JPS55100545A true JPS55100545A (en) 1980-07-31

Family

ID=11691111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP836279A Pending JPS55100545A (en) 1979-01-26 1979-01-26 Rotary coating method and rotary coating apparatus

Country Status (1)

Country Link
JP (1) JPS55100545A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197923A (ja) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6395626A (ja) * 1986-10-13 1988-04-26 Toshiba Corp レジストの塗布装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197923A (ja) * 1984-10-19 1986-05-16 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6395626A (ja) * 1986-10-13 1988-04-26 Toshiba Corp レジストの塗布装置

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