JPS55143035A - Manufacture of pattern - Google Patents
Manufacture of patternInfo
- Publication number
- JPS55143035A JPS55143035A JP5105279A JP5105279A JPS55143035A JP S55143035 A JPS55143035 A JP S55143035A JP 5105279 A JP5105279 A JP 5105279A JP 5105279 A JP5105279 A JP 5105279A JP S55143035 A JPS55143035 A JP S55143035A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resin
- theta
- angle
- eliminated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5105279A JPS55143035A (en) | 1979-04-24 | 1979-04-24 | Manufacture of pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5105279A JPS55143035A (en) | 1979-04-24 | 1979-04-24 | Manufacture of pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55143035A true JPS55143035A (en) | 1980-11-08 |
| JPH0121617B2 JPH0121617B2 (mo) | 1989-04-21 |
Family
ID=12876025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5105279A Granted JPS55143035A (en) | 1979-04-24 | 1979-04-24 | Manufacture of pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55143035A (mo) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59114824A (ja) * | 1982-12-21 | 1984-07-03 | Agency Of Ind Science & Technol | 半導体装置の平坦化方法 |
| JPS61183931A (ja) * | 1985-02-12 | 1986-08-16 | Trio Kenwood Corp | 絶縁膜表面の平坦化方法 |
| JPS61289635A (ja) * | 1985-06-17 | 1986-12-19 | Nippon Telegr & Teleph Corp <Ntt> | 表面平坦化方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5166778A (en) * | 1974-10-25 | 1976-06-09 | Hitachi Ltd | Handotaisochino seizohoho |
| JPS5432985A (en) * | 1977-08-19 | 1979-03-10 | Mitsubishi Electric Corp | Flattening method for substrate surface with protrusion |
-
1979
- 1979-04-24 JP JP5105279A patent/JPS55143035A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5166778A (en) * | 1974-10-25 | 1976-06-09 | Hitachi Ltd | Handotaisochino seizohoho |
| JPS5432985A (en) * | 1977-08-19 | 1979-03-10 | Mitsubishi Electric Corp | Flattening method for substrate surface with protrusion |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59114824A (ja) * | 1982-12-21 | 1984-07-03 | Agency Of Ind Science & Technol | 半導体装置の平坦化方法 |
| JPS61183931A (ja) * | 1985-02-12 | 1986-08-16 | Trio Kenwood Corp | 絶縁膜表面の平坦化方法 |
| JPS61289635A (ja) * | 1985-06-17 | 1986-12-19 | Nippon Telegr & Teleph Corp <Ntt> | 表面平坦化方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0121617B2 (mo) | 1989-04-21 |
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