JPS55159143A - Metal surface flaw detector - Google Patents
Metal surface flaw detectorInfo
- Publication number
- JPS55159143A JPS55159143A JP6768179A JP6768179A JPS55159143A JP S55159143 A JPS55159143 A JP S55159143A JP 6768179 A JP6768179 A JP 6768179A JP 6768179 A JP6768179 A JP 6768179A JP S55159143 A JPS55159143 A JP S55159143A
- Authority
- JP
- Japan
- Prior art keywords
- specimen
- radiation
- exoelectron
- measuring
- flaw detector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 abstract 4
- 238000005259 measurement Methods 0.000 abstract 2
- 238000009826 distribution Methods 0.000 abstract 1
- 230000002269 spontaneous effect Effects 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
PURPOSE:To detect the surface flaws of metal products accurately, rapidly and industrially by measuring the radiation quantity of exoelectron. CONSTITUTION:A flaw detector 1 is provided with a vacuum system 2, ultraviolet light radiation system 3, exoelectron measuring system 4, electro-optical system 5, observation system 6 and specimen driving system 7. The specimen 8 is set on a stage 14 in a vacuum vessel 8 which is maintained in a high vacuum state and ultraviolet light is imaged on the specimen by the system 3 to locally excite the specimen surface, by which the spontaneous radiation of exoelectron is accelerated. The intensity of the excoelectron radiated from the flawed portion of the surface is measured in the system 4. The scanning measuring of the specimen surface is accomplished by using the system 7, whereby the measurement of the linear and area distributions of the radiation intensities is done. The results of the measurement are recorded in an XY recorder 42.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6768179A JPS55159143A (en) | 1979-05-31 | 1979-05-31 | Metal surface flaw detector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6768179A JPS55159143A (en) | 1979-05-31 | 1979-05-31 | Metal surface flaw detector |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55159143A true JPS55159143A (en) | 1980-12-11 |
Family
ID=13351974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6768179A Pending JPS55159143A (en) | 1979-05-31 | 1979-05-31 | Metal surface flaw detector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55159143A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57197454A (en) * | 1981-05-29 | 1982-12-03 | Rigaku Denki Kogyo Kk | X-ray analysing apparatus |
| JPH03226952A (en) * | 1990-01-31 | 1991-10-07 | Shimadzu Corp | exo electron microscope |
| JPH03100351U (en) * | 1990-01-30 | 1991-10-21 |
-
1979
- 1979-05-31 JP JP6768179A patent/JPS55159143A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57197454A (en) * | 1981-05-29 | 1982-12-03 | Rigaku Denki Kogyo Kk | X-ray analysing apparatus |
| JPH03100351U (en) * | 1990-01-30 | 1991-10-21 | ||
| JPH03226952A (en) * | 1990-01-31 | 1991-10-07 | Shimadzu Corp | exo electron microscope |
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