JPS5518041A - Method of fabricating semiconductor device - Google Patents

Method of fabricating semiconductor device

Info

Publication number: JPS5518041A
Authority: JP; Japan
Prior art keywords: film; coated; lower layer; aluminum; opening
Prior art date: 1978-07-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP9079178A

Other languages

English (en)

Inventor

Masaru Nakamura

Kazuhiro Kikuchi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NEC Corp

Original Assignee

NEC Corp

Nippon Electric Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-07-24

Filing date

1978-07-24

Publication date

1980-02-07

1978-07-24 Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp

1978-07-24 Priority to JP9079178A priority Critical patent/JPS5518041A/ja

1980-02-07 Publication of JPS5518041A publication Critical patent/JPS5518041A/ja

Status Pending legal-status Critical Current

Links

239000004065 semiconductor Substances 0.000 title abstract 3
238000004519 manufacturing process Methods 0.000 title 1
239000010410 layer Substances 0.000 abstract 7
229910052782 aluminium Inorganic materials 0.000 abstract 5
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 5
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 abstract 4
239000012212 insulator Substances 0.000 abstract 3
229920002120 photoresistant polymer Polymers 0.000 abstract 3
238000009832 plasma treatment Methods 0.000 abstract 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
239000007888 film coating Substances 0.000 abstract 1
238000009501 film coating Methods 0.000 abstract 1
239000011229 interlayer Substances 0.000 abstract 1
229910052751 metal Inorganic materials 0.000 abstract 1
239000002184 metal Substances 0.000 abstract 1
229910052814 silicon oxide Inorganic materials 0.000 abstract 1
239000000758 substrate Substances 0.000 abstract 1

Landscapes

Drying Of Semiconductors (AREA)
Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

JP9079178A 1978-07-24 1978-07-24 Method of fabricating semiconductor device Pending JPS5518041A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP9079178A JPS5518041A (en)	1978-07-24	1978-07-24	Method of fabricating semiconductor device

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP9079178A JPS5518041A (en)	1978-07-24	1978-07-24	Method of fabricating semiconductor device

Publications (1)

Publication Number	Publication Date
JPS5518041A true JPS5518041A (en)	1980-02-07

Family

ID=14008402

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP9079178A Pending JPS5518041A (en)	1978-07-24	1978-07-24	Method of fabricating semiconductor device

Country Status (1)

Country	Link
JP (1)	JPS5518041A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS58176439U (ja) *	1982-05-20	1983-11-25	セイコーインスツルメンツ株式会社	腕時計型ラジオ
JPH0878256A (ja) *	1994-09-05	1996-03-22	Kyosan Electric Mfg Co Ltd	電磁コネクタ

1978
- 1978-07-24 JP JP9079178A patent/JPS5518041A/ja active Pending

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS58176439U (ja) *	1982-05-20	1983-11-25	セイコーインスツルメンツ株式会社	腕時計型ラジオ
JPH0878256A (ja) *	1994-09-05	1996-03-22	Kyosan Electric Mfg Co Ltd	電磁コネクタ

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