JPS5522832A - Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus - Google Patents

Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Info

Publication number
JPS5522832A
JPS5522832A JP9533278A JP9533278A JPS5522832A JP S5522832 A JPS5522832 A JP S5522832A JP 9533278 A JP9533278 A JP 9533278A JP 9533278 A JP9533278 A JP 9533278A JP S5522832 A JPS5522832 A JP S5522832A
Authority
JP
Japan
Prior art keywords
wafer
guide
belt
treatment process
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9533278A
Other languages
Japanese (ja)
Inventor
Mototsugu Ogura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP9533278A priority Critical patent/JPS5522832A/en
Publication of JPS5522832A publication Critical patent/JPS5522832A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To effect the reduction in process treatment time by arranging the apparatus for transferring the semiconductor wafers with the regist to the baking treatment process in parallel, allocating the wafers to either of apparatus just before being entered therein and sending them on the parallel belts within the apparatus alternately.
CONSTITUTION: Each semiconductor wafer 1 with the regist is transferred to a direction indicating guide 32 by use of an air bearing 31 and then proceeded to right or left path alternately at that point. Next, the wafer 1 allocated to either path is transferred via a wafer guide 33, air bearing 34 and induction revolution shaft 35 with high coefficient of friction made of heat resisting rubber to a belt 27 made of phosphor copper, which is located on a preheater 27, driven by use of induction revolution shafts 39 and 40. After that, the wafer is sent to a baking treatment process with the aid of an induction revolution shaft 37, guide 41 and bearing 42. On the other hand, the wafer 1 allocated to the other path by the direction indicating guide 32 is also transferred via a belt 28 in parallel to the belt 27 into the baking treatment process through the same course as that for the preceded wafer 1.
COPYRIGHT: (C)1980,JPO&Japio
JP9533278A 1978-08-03 1978-08-03 Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus Pending JPS5522832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9533278A JPS5522832A (en) 1978-08-03 1978-08-03 Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9533278A JPS5522832A (en) 1978-08-03 1978-08-03 Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Publications (1)

Publication Number Publication Date
JPS5522832A true JPS5522832A (en) 1980-02-18

Family

ID=14134754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9533278A Pending JPS5522832A (en) 1978-08-03 1978-08-03 Semiconconductor manufacturing apparatus and method of manufacturing semiconductor device by use of its apparatus

Country Status (1)

Country Link
JP (1) JPS5522832A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5957447A (en) * 1982-09-28 1984-04-03 Oki Electric Ind Co Ltd Conveyor for wafer

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503546A (en) * 1973-05-14 1975-01-14
JPS5037660U (en) * 1973-07-31 1975-04-19
JPS5214370A (en) * 1975-07-25 1977-02-03 Hitachi Ltd Baking device
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5352071A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Baking unit of plate-shaped object

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503546A (en) * 1973-05-14 1975-01-14
JPS5037660U (en) * 1973-07-31 1975-04-19
JPS5214370A (en) * 1975-07-25 1977-02-03 Hitachi Ltd Baking device
JPS52154370A (en) * 1976-06-18 1977-12-22 Hitachi Ltd Photo resist film treatment apparatus of semiconductor wafers
JPS5352071A (en) * 1976-10-22 1978-05-12 Hitachi Ltd Baking unit of plate-shaped object

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5957447A (en) * 1982-09-28 1984-04-03 Oki Electric Ind Co Ltd Conveyor for wafer

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