JPS5523163A - Polyvinyl alcohol type photosensitive resin and its preparation - Google Patents

Polyvinyl alcohol type photosensitive resin and its preparation

Info

Publication number
JPS5523163A
JPS5523163A JP9680378A JP9680378A JPS5523163A JP S5523163 A JPS5523163 A JP S5523163A JP 9680378 A JP9680378 A JP 9680378A JP 9680378 A JP9680378 A JP 9680378A JP S5523163 A JPS5523163 A JP S5523163A
Authority
JP
Japan
Prior art keywords
photosensitive resin
polyvinyl alcohol
preparation
type photosensitive
alcohol type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9680378A
Other languages
English (en)
Japanese (ja)
Other versions
JPS565761B2 (de
Inventor
Kunihiro Ichimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP9680378A priority Critical patent/JPS5523163A/ja
Priority to US06/062,490 priority patent/US4272620A/en
Priority to GB7927178A priority patent/GB2030575B/en
Priority to DE2932376A priority patent/DE2932376C2/de
Publication of JPS5523163A publication Critical patent/JPS5523163A/ja
Publication of JPS565761B2 publication Critical patent/JPS565761B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
  • Pyridine Compounds (AREA)
JP9680378A 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation Granted JPS5523163A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation
US06/062,490 US4272620A (en) 1978-08-09 1979-07-31 Polyvinyl alcohol-styrylpyridinium photosensitive resins and method for manufacture thereof
GB7927178A GB2030575B (en) 1978-08-09 1979-08-03 Photosensitive resin and method for manufacture thereof
DE2932376A DE2932376C2 (de) 1978-08-09 1979-08-09 Lichtempfindliche Polyvinylalkoholderivate, Verfahren zu ihrer Herstellung und ihre Verwendung im Siebdruck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9680378A JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Publications (2)

Publication Number Publication Date
JPS5523163A true JPS5523163A (en) 1980-02-19
JPS565761B2 JPS565761B2 (de) 1981-02-06

Family

ID=14174768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9680378A Granted JPS5523163A (en) 1978-08-09 1978-08-09 Polyvinyl alcohol type photosensitive resin and its preparation

Country Status (1)

Country Link
JP (1) JPS5523163A (de)

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137889A (en) * 1980-03-31 1981-10-28 Agency Of Ind Science & Technol Immobilized enzyme and its production
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS59102232A (ja) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol スクリーン印刷版製造用感光性材料
JPS6287394A (ja) * 1985-10-14 1987-04-21 Shin Etsu Chem Co Ltd スクリ−ン印刷用メツシユ複合材料
JPS62129107A (ja) * 1985-11-29 1987-06-11 Agency Of Ind Science & Technol 水と水溶性有機溶媒との分離方法
EP0373537A1 (de) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Lichtempfindliches Polyvinylalkoholderivat
WO1998013394A1 (en) * 1996-09-27 1998-04-02 Sun Chemical Corporation Water soluble and oxygen-impermeable polymeric layers
US5948592A (en) * 1997-10-20 1999-09-07 Fuji Chemicals Industrial Co., Ltd. Water-soluble photoresist composition
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
JP2005202066A (ja) * 2004-01-14 2005-07-28 Fuji Photo Film Co Ltd 感光性転写シート、感光性積層体、画像パターンを形成する方法、配線パターンを形成する方法
KR100477984B1 (ko) * 1997-08-30 2005-12-30 삼성에스디아이 주식회사 포토레지스트용 감광성 고분자 및 이의 제조방법
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0220121A3 (de) * 1985-10-14 1987-07-01 Shin-Etsu Chemical Co., Ltd. Verfahren zur Herstellung einer Siebdruckschablone

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56137889A (en) * 1980-03-31 1981-10-28 Agency Of Ind Science & Technol Immobilized enzyme and its production
JPS56147804A (en) * 1980-04-17 1981-11-17 Agency Of Ind Science & Technol Photosensitive resin material for forming fluorescent surface of cathode ray tube
JPS59102232A (ja) * 1982-12-03 1984-06-13 Agency Of Ind Science & Technol スクリーン印刷版製造用感光性材料
JPS6287394A (ja) * 1985-10-14 1987-04-21 Shin Etsu Chem Co Ltd スクリ−ン印刷用メツシユ複合材料
JPS62129107A (ja) * 1985-11-29 1987-06-11 Agency Of Ind Science & Technol 水と水溶性有機溶媒との分離方法
EP0373537A1 (de) 1988-12-14 1990-06-20 THE STATE OF JAPAN, as Represented by the DIRECTOR GENERAL of the AGENCY of INDUSTRIAL SCIENCE and TECHNOLOGY Lichtempfindliches Polyvinylalkoholderivat
WO1998013394A1 (en) * 1996-09-27 1998-04-02 Sun Chemical Corporation Water soluble and oxygen-impermeable polymeric layers
US6140007A (en) * 1997-04-30 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
KR100477984B1 (ko) * 1997-08-30 2005-12-30 삼성에스디아이 주식회사 포토레지스트용 감광성 고분자 및 이의 제조방법
US5948592A (en) * 1997-10-20 1999-09-07 Fuji Chemicals Industrial Co., Ltd. Water-soluble photoresist composition
US6136507A (en) * 1998-03-12 2000-10-24 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6475702B2 (en) 1998-03-12 2002-11-05 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6322952B1 (en) 1998-03-12 2001-11-27 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6238841B1 (en) 1998-05-12 2001-05-29 Goo Chemical Co., Ltd. Photosensitive resin composition and photoresist ink for manufacturing printed wiring boards
US6020093A (en) * 1998-05-13 2000-02-01 Toyo Gosei Kogyo, Ltd. Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions
US6140018A (en) * 1998-08-05 2000-10-31 Toyo Gosei Kogyo Co., Ltd. Photosensitive resin and composition thereof derived from saponified poly(vinyl acetate) and pattern formation method
US6342330B2 (en) 1998-09-24 2002-01-29 Toyo Gosei Kogyo Co., Ltd. Photosensitive compositions and pattern formation method
JP2005202066A (ja) * 2004-01-14 2005-07-28 Fuji Photo Film Co Ltd 感光性転写シート、感光性積層体、画像パターンを形成する方法、配線パターンを形成する方法
JP2016193985A (ja) * 2015-03-31 2016-11-17 株式会社Adeka 重合体及び光硬化性組成物

Also Published As

Publication number Publication date
JPS565761B2 (de) 1981-02-06

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