JPS5533010A - Semiconductor integrated circuit - Google Patents
Semiconductor integrated circuitInfo
- Publication number
- JPS5533010A JPS5533010A JP10437578A JP10437578A JPS5533010A JP S5533010 A JPS5533010 A JP S5533010A JP 10437578 A JP10437578 A JP 10437578A JP 10437578 A JP10437578 A JP 10437578A JP S5533010 A JPS5533010 A JP S5533010A
- Authority
- JP
- Japan
- Prior art keywords
- base
- gate
- impurities
- diffusion
- type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/211—Design considerations for internal polarisation
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
- Logic Circuits (AREA)
Abstract
PURPOSE:To accomplish a higher speed of I<2>L gate by specifying the degree of the diffusion and the concentration of the impurities in arrnaging a hrizontal element having the I<2>L gate and a normal vertical pipolar element each on two sections of an epitaxial layer separated after it grows on the semiconductor substrate. CONSTITUTION:Two N<+>-type buried regions 4 are formed by diffusion on a P-type Si substrate 1, and a N-type layer is epitaxially grown entirely on the regions. Then, the layer 3 is separated into two islands by a P<+>-type region 3. An I<2>L gate is provided on one island and a normal bipolar element on the other island. Here, an emitter 11 and an external base of an injector horizontal element for I<2>L gate is made higher in the centration of impurities than an internal base 14 immediately below a collector of the vertical element. Thus, a double base construction is formed with a larger degree of the diffusion. On the other hand, the bipolar element also is developed as a double base construction by forming an external base 15, an external base of the I<2>L gate and shallow internal base 16. Here, the concentration of impurities of the internal base 16 is made higher than that of the internal base 14.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10437578A JPS5533010A (en) | 1978-08-29 | 1978-08-29 | Semiconductor integrated circuit |
| GB7929463A GB2029100B (en) | 1978-08-29 | 1979-08-23 | Integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10437578A JPS5533010A (en) | 1978-08-29 | 1978-08-29 | Semiconductor integrated circuit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5533010A true JPS5533010A (en) | 1980-03-08 |
Family
ID=14379029
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10437578A Pending JPS5533010A (en) | 1978-08-29 | 1978-08-29 | Semiconductor integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5533010A (en) |
-
1978
- 1978-08-29 JP JP10437578A patent/JPS5533010A/en active Pending
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