JPS553355A - Boron film forming method - Google Patents

Boron film forming method

Info

Publication number
JPS553355A
JPS553355A JP7604278A JP7604278A JPS553355A JP S553355 A JPS553355 A JP S553355A JP 7604278 A JP7604278 A JP 7604278A JP 7604278 A JP7604278 A JP 7604278A JP S553355 A JPS553355 A JP S553355A
Authority
JP
Japan
Prior art keywords
boron
substrate
diffuse
chemically
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7604278A
Other languages
Japanese (ja)
Other versions
JPS5617286B2 (en
Inventor
Masaki Aoki
Hiroshi Yamazoe
Masahiro Nagasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP7604278A priority Critical patent/JPS553355A/en
Publication of JPS553355A publication Critical patent/JPS553355A/en
Publication of JPS5617286B2 publication Critical patent/JPS5617286B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0209—Pretreatment of the material to be coated by heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE:To form a boron film with superior mechanical strength enough to prevent cracking, when separated from a metal substrate, by heat treating amorphous boron formed on the substrate to diffuse the boron into the substrate and by chemically vacuum-depositing beta-rhombohedral boron on the substrate. CONSTITUTION:A metal substrate such as a Ta wire set in a furnace core tube is heated to 800-1200 deg.C to deposit amorphous boron on the substrate according to reducing decomposition reaction of the following equation: 2BX3+2H2 2B+ 6HX3 (where X is a halogen element such as Cl, Br or I). The amorphous boron- deposited substrate is then heat treated at 1200-1800 deg.C to diffuse the boron into the substrate. On the boron-diffused substrate beta-rhombohedral boron is chemically vacuum-deposited at 1250-1400 deg.C to form a desired boron film.
JP7604278A 1978-06-22 1978-06-22 Boron film forming method Granted JPS553355A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7604278A JPS553355A (en) 1978-06-22 1978-06-22 Boron film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7604278A JPS553355A (en) 1978-06-22 1978-06-22 Boron film forming method

Publications (2)

Publication Number Publication Date
JPS553355A true JPS553355A (en) 1980-01-11
JPS5617286B2 JPS5617286B2 (en) 1981-04-21

Family

ID=13593735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7604278A Granted JPS553355A (en) 1978-06-22 1978-06-22 Boron film forming method

Country Status (1)

Country Link
JP (1) JPS553355A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149763A (en) * 1984-01-17 1985-08-07 Toshiba Corp Manufacture of color tone memory element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149763A (en) * 1984-01-17 1985-08-07 Toshiba Corp Manufacture of color tone memory element

Also Published As

Publication number Publication date
JPS5617286B2 (en) 1981-04-21

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