JPS5544760A - Automatic registering exposure system - Google Patents
Automatic registering exposure systemInfo
- Publication number
- JPS5544760A JPS5544760A JP11822978A JP11822978A JPS5544760A JP S5544760 A JPS5544760 A JP S5544760A JP 11822978 A JP11822978 A JP 11822978A JP 11822978 A JP11822978 A JP 11822978A JP S5544760 A JPS5544760 A JP S5544760A
- Authority
- JP
- Japan
- Prior art keywords
- light
- target
- interferring
- passing
- step portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To enable target pattern to be made in almost all the processes for manufacturing semiconductors by detecting interferring light from the coming on two light paths due to the variation in thickness of insulating film.
CONSTITUTION: The light having come out of a light source 8 is linearly polarized by passing through a polarizing plate 9. When applied to a Normarsky prism 14 after reflected by a half-mirror 13, this linear polalization is separated into two light whose oscillation planes are orthogonal with each other. The light is projected to a target on the surface of a semiconductor substrate 17 after passing through a lens 15 and a photo-mask 16. Since the target has a step portion formed of Si oxide film, the two light cause a difference in phase due to that between light paths after reflection. Further, the two light are combined into one light by the prism 14, generates interferring light when passing a polarizing plate 12, and reaches a photoelectric conversion element 10. The element 10 can be informed of the position of the target by detecting the interference of the interferring light. Thereby, detection becomes possible at the target pattern made only of the step portion of Si film without any Si step portion.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11822978A JPS5544760A (en) | 1978-09-25 | 1978-09-25 | Automatic registering exposure system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11822978A JPS5544760A (en) | 1978-09-25 | 1978-09-25 | Automatic registering exposure system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5544760A true JPS5544760A (en) | 1980-03-29 |
Family
ID=14731413
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11822978A Pending JPS5544760A (en) | 1978-09-25 | 1978-09-25 | Automatic registering exposure system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5544760A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0185814U (en) * | 1987-11-30 | 1989-06-07 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4722213U (en) * | 1971-04-09 | 1972-11-13 | ||
| JPS5270771A (en) * | 1975-12-10 | 1977-06-13 | Toshiba Corp | Position matching method |
-
1978
- 1978-09-25 JP JP11822978A patent/JPS5544760A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4722213U (en) * | 1971-04-09 | 1972-11-13 | ||
| JPS5270771A (en) * | 1975-12-10 | 1977-06-13 | Toshiba Corp | Position matching method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0185814U (en) * | 1987-11-30 | 1989-06-07 |
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