JPS5565453A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5565453A JPS5565453A JP13867778A JP13867778A JPS5565453A JP S5565453 A JPS5565453 A JP S5565453A JP 13867778 A JP13867778 A JP 13867778A JP 13867778 A JP13867778 A JP 13867778A JP S5565453 A JPS5565453 A JP S5565453A
- Authority
- JP
- Japan
- Prior art keywords
- region
- resistor
- type
- parasitic
- capacitance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/201—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
- H10D84/204—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
- H10D84/209—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To reduce the parasitic capacitance and increase the operational speed, by providing resistor elements in two regions of conduction type opposite to that of the semiconductor substrate and biasing one region via the resistance element of the other region. CONSTITUTION:An n-type regions 2 and 22 are formed on p<->-type semiconductor substrate 1 by dividing by a p-type region. p-type resistor 3 is formed in region 2, and p-type resistor 23 is formed in region 22. Region 2 is connected to electrode 24 on one side, and electrode 6 on the other side is connected to the maximum potential of the IC. For this reason, parasitic capacitance C1 is produced by parasitic junction 31 of resistor 3 and region 2, and parasitic capacitance C2 is produced by parasitic junctions 32, 33 and 34 between substrate 1 and resistor 23. Equivalent capacitance between terminals 5 and 1 becomes smaller than capacitance C1. By this structure, it is possible to reduce the capacitance parasitic to the resistor in the integrated semiconductor device and to increase its operational speed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13867778A JPS5565453A (en) | 1978-11-10 | 1978-11-10 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13867778A JPS5565453A (en) | 1978-11-10 | 1978-11-10 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5565453A true JPS5565453A (en) | 1980-05-16 |
Family
ID=15227519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13867778A Pending JPS5565453A (en) | 1978-11-10 | 1978-11-10 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5565453A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159366A (en) * | 1982-03-18 | 1983-09-21 | Nec Corp | Current mirror circuit |
| JPS60169161A (en) * | 1984-02-13 | 1985-09-02 | Rohm Co Ltd | Capacitor element |
| US4578695A (en) * | 1982-11-26 | 1986-03-25 | International Business Machines Corporation | Monolithic autobiased resistor structure and application thereof to interface circuits |
| JPS6292458A (en) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | semiconductor capacitive coupling element |
| JPS6292459A (en) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | semiconductor capacitive coupling element |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5132354A (en) * | 1974-09-12 | 1976-03-18 | Toho Gas Kk | GASUMEETAA |
-
1978
- 1978-11-10 JP JP13867778A patent/JPS5565453A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5132354A (en) * | 1974-09-12 | 1976-03-18 | Toho Gas Kk | GASUMEETAA |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58159366A (en) * | 1982-03-18 | 1983-09-21 | Nec Corp | Current mirror circuit |
| US4578695A (en) * | 1982-11-26 | 1986-03-25 | International Business Machines Corporation | Monolithic autobiased resistor structure and application thereof to interface circuits |
| JPS60169161A (en) * | 1984-02-13 | 1985-09-02 | Rohm Co Ltd | Capacitor element |
| JPS6292458A (en) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | semiconductor capacitive coupling element |
| JPS6292459A (en) * | 1985-10-18 | 1987-04-27 | Sanyo Electric Co Ltd | semiconductor capacitive coupling element |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS54157092A (en) | Semiconductor integrated circuit device | |
| US3134912A (en) | Multivibrator employing field effect devices as transistors and voltage variable resistors in integrated semiconductive structure | |
| GB1133634A (en) | Improvements in or relating to semiconductor voltage-dependent capacitors | |
| GB1173919A (en) | Semiconductor Device with a pn-Junction | |
| GB920630A (en) | Improvements in the fabrication of semiconductor elements | |
| JPS5565453A (en) | Semiconductor device | |
| KR830009654A (en) | Integrated circuit device protection circuit | |
| JPS57208177A (en) | Semiconductor negative resistance element | |
| GB1219660A (en) | Integrated semiconductor circuits | |
| GB945736A (en) | Improvements relating to semiconductor circuits | |
| JPS5346285A (en) | Mesa type high breakdown voltage semiconductor device | |
| JPS5588372A (en) | Lateral type transistor | |
| JPS5580350A (en) | Semiconductor integrated circuit | |
| JPS54119653A (en) | Constant voltage generating circuit | |
| JPS5587391A (en) | Semiconductor memory circuit device | |
| JPS55117270A (en) | Junction breakdown type field programmable cell array semiconductor device | |
| JPS5469391A (en) | Integrated composite element | |
| JPS5377476A (en) | Semiconductor integrated circuit device | |
| JPS5621357A (en) | Integrated circuit device | |
| JPS57162356A (en) | Integrated circuit device | |
| JPS5378783A (en) | Semiconductor device | |
| GB910050A (en) | Improvements in or relating to semiconductor devices | |
| JPS5526683A (en) | Semiconductor integrated circuit device | |
| JPS55128857A (en) | Integrated circuit device | |
| JPS55166953A (en) | Semiconductor integrated circuit device |