JPS5568652A - Manufacturing method of semiconductor film - Google Patents
Manufacturing method of semiconductor filmInfo
- Publication number
- JPS5568652A JPS5568652A JP14116378A JP14116378A JPS5568652A JP S5568652 A JPS5568652 A JP S5568652A JP 14116378 A JP14116378 A JP 14116378A JP 14116378 A JP14116378 A JP 14116378A JP S5568652 A JPS5568652 A JP S5568652A
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor film
- amorphous
- single crystal
- harmful substances
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14116378A JPS5568652A (en) | 1978-11-17 | 1978-11-17 | Manufacturing method of semiconductor film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14116378A JPS5568652A (en) | 1978-11-17 | 1978-11-17 | Manufacturing method of semiconductor film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5568652A true JPS5568652A (en) | 1980-05-23 |
Family
ID=15285592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14116378A Pending JPS5568652A (en) | 1978-11-17 | 1978-11-17 | Manufacturing method of semiconductor film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5568652A (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5975670A (ja) * | 1982-10-25 | 1984-04-28 | Seiko Epson Corp | 薄膜半導体装置の製造方法 |
-
1978
- 1978-11-17 JP JP14116378A patent/JPS5568652A/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5975670A (ja) * | 1982-10-25 | 1984-04-28 | Seiko Epson Corp | 薄膜半導体装置の製造方法 |
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