JPS5575220A - Ion-etching apparatus - Google Patents

Ion-etching apparatus

Info

Publication number
JPS5575220A
JPS5575220A JP14936678A JP14936678A JPS5575220A JP S5575220 A JPS5575220 A JP S5575220A JP 14936678 A JP14936678 A JP 14936678A JP 14936678 A JP14936678 A JP 14936678A JP S5575220 A JPS5575220 A JP S5575220A
Authority
JP
Japan
Prior art keywords
container
hole
holder
specimens
holders
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14936678A
Other languages
Japanese (ja)
Inventor
Taiji Hiraga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP14936678A priority Critical patent/JPS5575220A/en
Publication of JPS5575220A publication Critical patent/JPS5575220A/en
Pending legal-status Critical Current

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  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE: To increase the amount of specimen treatment by providng a plurality of specimen holders in a container, in the case the specimens are etched by an ion beam in a vacuum container.
CONSTITUTION: A shutter 3, which pierces through the top center of a vacuum container 2 having an exhausting hole 1 on its side, is provided so that the shutter is freely rotated. On the top of the other side of the container 2, is provided a discharge chamber 4 having a gas introducing hole 5, with a connecting hole to the container 2 being provided. A filament grid is enclosed in the discharge chamber 4. At the bottom of the container 2, two coaxial specimen holders 6a and 6b are provided so that they can be freely rotated by a driving unit 7 located at the outside. A space is provided between the upper holder 6a and the lower holder 6b. Specimens 8 are concentrically placed on said holders. A through hole 14 is provided in the part of the upper holder 6a. Ar gas introduced from the introducing hole 5 is ionized and etches the specimens on the holder 6a. Then, the holder 6a is rotated and the ions are introduced through the hole 14 and are projected to the lower holder 6b, thereby the specimens 8 are etched.
COPYRIGHT: (C)1980,JPO&Japio
JP14936678A 1978-12-01 1978-12-01 Ion-etching apparatus Pending JPS5575220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14936678A JPS5575220A (en) 1978-12-01 1978-12-01 Ion-etching apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14936678A JPS5575220A (en) 1978-12-01 1978-12-01 Ion-etching apparatus

Publications (1)

Publication Number Publication Date
JPS5575220A true JPS5575220A (en) 1980-06-06

Family

ID=15473560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14936678A Pending JPS5575220A (en) 1978-12-01 1978-12-01 Ion-etching apparatus

Country Status (1)

Country Link
JP (1) JPS5575220A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821333A (en) * 1981-07-30 1983-02-08 Kokusai Electric Co Ltd Sample holding device for ion beam etching equipment
JPS6042832A (en) * 1983-08-18 1985-03-07 Matsushita Electric Ind Co Ltd Ion beam device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5821333A (en) * 1981-07-30 1983-02-08 Kokusai Electric Co Ltd Sample holding device for ion beam etching equipment
JPS6042832A (en) * 1983-08-18 1985-03-07 Matsushita Electric Ind Co Ltd Ion beam device

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