JPS5586116A - Drier - Google Patents
DrierInfo
- Publication number
- JPS5586116A JPS5586116A JP15854478A JP15854478A JPS5586116A JP S5586116 A JPS5586116 A JP S5586116A JP 15854478 A JP15854478 A JP 15854478A JP 15854478 A JP15854478 A JP 15854478A JP S5586116 A JPS5586116 A JP S5586116A
- Authority
- JP
- Japan
- Prior art keywords
- drying
- wafer
- pusher
- cup
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001035 drying Methods 0.000 abstract 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 238000005406 washing Methods 0.000 abstract 2
- 230000003749 cleanliness Effects 0.000 abstract 1
- 230000002542 deteriorative effect Effects 0.000 abstract 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To carry out drying in a short time without deteriorating cleanliness by providing a rotary mechanism to rotate products, a forced exhaust mechanism, and a dry accelerating mechanism to blow a drying gas in a drying room provided on a path through which to convey products after washing.
CONSTITUTION: After washing through pure water in a rinsing tank 10, a wafer 11 to treat is fed to a rotary disc 20 in a drying room formed with a cup 32 and a cover 36 from a supply guide 17 through a pusher 12. A drying gas is blown through a feed pipe 37 of the cover 36, and exhausted forcedly through an exhaust port provided on the cup 32. A rotary table 20 runs at high speed to shake off water content on the surface of the wafer 11 through centrifugal force. Then, the drying gas is blown onto the surface of the wafer 11, therefore drying is accelerated. Next, the wafer 11 is fed on a conveying guide 18 by the pusher 26, passes further through a blast drying oven and thus has the water content staying residual on the wafer 11 evaporated thoroughly to dryness.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15854478A JPS5586116A (en) | 1978-12-25 | 1978-12-25 | Drier |
| US06/061,049 US4282825A (en) | 1978-08-02 | 1979-07-26 | Surface treatment device |
| DE19792931308 DE2931308A1 (en) | 1978-08-02 | 1979-08-01 | SURFACE TREATMENT DEVICE |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15854478A JPS5586116A (en) | 1978-12-25 | 1978-12-25 | Drier |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5586116A true JPS5586116A (en) | 1980-06-28 |
Family
ID=15674018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15854478A Pending JPS5586116A (en) | 1978-08-02 | 1978-12-25 | Drier |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5586116A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57154835A (en) * | 1981-03-20 | 1982-09-24 | Hitachi Ltd | Method and apparatus for drying tabular material |
| JPS581630U (en) * | 1981-06-29 | 1983-01-07 | 三菱重工業株式会社 | High pressure gate structure |
| JPS6030140A (en) * | 1983-07-28 | 1985-02-15 | Fujitsu Ltd | Spin drier |
| JPS6064436A (en) * | 1983-09-19 | 1985-04-13 | Fujitsu Ltd | Spin drier |
| JPS6373626A (en) * | 1986-09-17 | 1988-04-04 | Hitachi Ltd | processing equipment |
| EP1571694A4 (en) * | 2002-12-10 | 2008-10-15 | Nikon Corp | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE |
| US10566217B2 (en) | 2018-03-27 | 2020-02-18 | Global Unichip Corporation | Drying apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5377460A (en) * | 1976-12-21 | 1978-07-08 | Sony Corp | Washing unit of semiconductor wafer |
| JPS53138278A (en) * | 1977-05-10 | 1978-12-02 | Toshiba Corp | Drier for wafer |
-
1978
- 1978-12-25 JP JP15854478A patent/JPS5586116A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5377460A (en) * | 1976-12-21 | 1978-07-08 | Sony Corp | Washing unit of semiconductor wafer |
| JPS53138278A (en) * | 1977-05-10 | 1978-12-02 | Toshiba Corp | Drier for wafer |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57154835A (en) * | 1981-03-20 | 1982-09-24 | Hitachi Ltd | Method and apparatus for drying tabular material |
| JPS581630U (en) * | 1981-06-29 | 1983-01-07 | 三菱重工業株式会社 | High pressure gate structure |
| JPS6030140A (en) * | 1983-07-28 | 1985-02-15 | Fujitsu Ltd | Spin drier |
| JPS6064436A (en) * | 1983-09-19 | 1985-04-13 | Fujitsu Ltd | Spin drier |
| JPS6373626A (en) * | 1986-09-17 | 1988-04-04 | Hitachi Ltd | processing equipment |
| EP1571694A4 (en) * | 2002-12-10 | 2008-10-15 | Nikon Corp | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE |
| US8034539B2 (en) | 2002-12-10 | 2011-10-11 | Nikon Corporation | Exposure apparatus and method for producing device |
| US10566217B2 (en) | 2018-03-27 | 2020-02-18 | Global Unichip Corporation | Drying apparatus |
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