JPS56110283A - Manufacture of embedded circuit structure-type semiconductor laser device - Google Patents
Manufacture of embedded circuit structure-type semiconductor laser deviceInfo
- Publication number
- JPS56110283A JPS56110283A JP1217580A JP1217580A JPS56110283A JP S56110283 A JPS56110283 A JP S56110283A JP 1217580 A JP1217580 A JP 1217580A JP 1217580 A JP1217580 A JP 1217580A JP S56110283 A JPS56110283 A JP S56110283A
- Authority
- JP
- Japan
- Prior art keywords
- laminated body
- semiconductor
- semiconductor laminated
- manufacture
- type semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To facilitate etching process on a high-resistance region by forming a semiconductor laminated body on a semiconductor substrate, then forming a high- resistance region and a high-resistance layer and finally a semiconductor clad layer. CONSTITUTION:A semiconductor laminated body C1 is formed on a semiconductor substrate 21. Next, in order to form a semiconductor laminated body C2 having a stripe-shaped semiconductor laminated body E on the semiconductor laminated body C1, a high-resistance region D1 is formed. Following this procedure, a high-resistance layer D2 is formed on the surface of the semiconductor laminated body C2 by etching the high-resistance region D1. Further, the stripe-shaped semiconductor laminated body E of the semiconductor laminated body C2 is embedded by means of a semiconductor layer B6. After this step, a semiconductor ohm contact layer F and metal electrode G1, G2 are formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1217580A JPS56110283A (en) | 1980-02-04 | 1980-02-04 | Manufacture of embedded circuit structure-type semiconductor laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1217580A JPS56110283A (en) | 1980-02-04 | 1980-02-04 | Manufacture of embedded circuit structure-type semiconductor laser device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56110283A true JPS56110283A (en) | 1981-09-01 |
Family
ID=11798085
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1217580A Pending JPS56110283A (en) | 1980-02-04 | 1980-02-04 | Manufacture of embedded circuit structure-type semiconductor laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56110283A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58219789A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Embedded optical semiconductor device |
| JPS60115284A (en) * | 1983-11-26 | 1985-06-21 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser and manufacture thereof |
| JPS61230388A (en) * | 1985-04-05 | 1986-10-14 | Fujitsu Ltd | Buried type semiconductor laser |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5496386A (en) * | 1978-01-14 | 1979-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of buried optical semiconductor device |
| JPS54152879A (en) * | 1978-05-23 | 1979-12-01 | Sharp Corp | Structure of semiconductor laser element and its manufacture |
-
1980
- 1980-02-04 JP JP1217580A patent/JPS56110283A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5496386A (en) * | 1978-01-14 | 1979-07-30 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of buried optical semiconductor device |
| JPS54152879A (en) * | 1978-05-23 | 1979-12-01 | Sharp Corp | Structure of semiconductor laser element and its manufacture |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58219789A (en) * | 1982-06-16 | 1983-12-21 | Hitachi Ltd | Embedded optical semiconductor device |
| JPS60115284A (en) * | 1983-11-26 | 1985-06-21 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor laser and manufacture thereof |
| JPS61230388A (en) * | 1985-04-05 | 1986-10-14 | Fujitsu Ltd | Buried type semiconductor laser |
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