JPS56274A - Continuous vacuum deposition apparatus - Google Patents
Continuous vacuum deposition apparatusInfo
- Publication number
- JPS56274A JPS56274A JP7571279A JP7571279A JPS56274A JP S56274 A JPS56274 A JP S56274A JP 7571279 A JP7571279 A JP 7571279A JP 7571279 A JP7571279 A JP 7571279A JP S56274 A JPS56274 A JP S56274A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- substrate
- substrates
- supporter
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 5
- 239000000758 substrate Substances 0.000 abstract 11
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To perform continuous, economical vacuum-deposition on plural number of large substrates by a method wherein both supporters for substrates before and after vacuum-deposition, substrate-transfer device between both the supporters, etc. are installed in a continuous vacuum deposition apparatus. CONSTITUTION:In a vacuum container, a supporter 7 for substrates 5 before vacuum deposition, a supporter 1 for vacuum deposited-substrate 5, a transfer device 100 for substrates 5 between both the supporters, evaporation source boats 2, 3, 4, etc. are installed. The substrate transfer device 100 consists of a vertical transfer device not shown and a rotary drive device to perform transfer. The device 100 is interlocked with an arm 8 having a magnetic contact device at one end and a micro-switch at the other end. The arm 8 takes a substrate 5 and moves it to the supporter 1. After the specified metal deposition is finished, the arm moves the substrate to the specified position of a supporter 6 for deposited substrates. There are no such charge and discharge of substrate in and from other vacuum container as are in conventional manner, so that plural number of large substrates can be continuously vacuum-deposited, effecting high economy.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7571279A JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7571279A JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56274A true JPS56274A (en) | 1981-01-06 |
Family
ID=13584120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7571279A Pending JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56274A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2594102A1 (en) * | 1986-02-12 | 1987-08-14 | Stein Heurtey | AUTOMATED FLEXIBLE FAST THERMOCHEMICAL PROCESSING FACILITY |
| FR2621023A1 (en) * | 1987-09-24 | 1989-03-31 | Stein Heurtey | AUTOMATIC FAST THERMOCHEMICAL TREATMENT SYSTEM |
-
1979
- 1979-06-18 JP JP7571279A patent/JPS56274A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2594102A1 (en) * | 1986-02-12 | 1987-08-14 | Stein Heurtey | AUTOMATED FLEXIBLE FAST THERMOCHEMICAL PROCESSING FACILITY |
| FR2621023A1 (en) * | 1987-09-24 | 1989-03-31 | Stein Heurtey | AUTOMATIC FAST THERMOCHEMICAL TREATMENT SYSTEM |
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