JPS5462984A - Masking deposition method - Google Patents
Masking deposition methodInfo
- Publication number
- JPS5462984A JPS5462984A JP11594878A JP11594878A JPS5462984A JP S5462984 A JPS5462984 A JP S5462984A JP 11594878 A JP11594878 A JP 11594878A JP 11594878 A JP11594878 A JP 11594878A JP S5462984 A JPS5462984 A JP S5462984A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- incidence
- angle
- mask
- evaporated material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000151 deposition Methods 0.000 title abstract 4
- 230000000873 masking effect Effects 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 7
- 239000000463 material Substances 0.000 abstract 3
- 230000008021 deposition Effects 0.000 abstract 2
- 230000008020 evaporation Effects 0.000 abstract 2
- 238000001704 evaporation Methods 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 230000000694 effects Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To obtain a product of improved pattern preciseness in a good yield, by controlling angle of incidence of evaporated material, which is to be deposited on the substrate, between the evaporation source and the mask placed on the substrate. CONSTITUTION:In depositing metal 3 in vacuum on a substrate 1 through a metal mask 2, evaporated material is made to fall upon the substrate 1 with its angle of incidence controlled. The angle of incidence is controlled by the incidence of the evaporated material through a cylinder 5 or a slit 6 placed between the mask 2 and evaporation source 3. The cylinder 5 or the slit 6 may be remolved together with the substrate 1, or allowed to stand still. This method effects deposition with excellent pattern preciseness even when plural substrates are subjected to simultaneous masking deposition while the substrates revolving.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11594878A JPS5462984A (en) | 1978-09-22 | 1978-09-22 | Masking deposition method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11594878A JPS5462984A (en) | 1978-09-22 | 1978-09-22 | Masking deposition method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5462984A true JPS5462984A (en) | 1979-05-21 |
Family
ID=14675115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11594878A Pending JPS5462984A (en) | 1978-09-22 | 1978-09-22 | Masking deposition method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5462984A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02131134A (en) * | 1988-11-12 | 1990-05-18 | Shinku Yakin Kk | Organic ultrafine particle production equipment |
| JPH04116925A (en) * | 1990-09-07 | 1992-04-17 | Kanegafuchi Chem Ind Co Ltd | Method for forming patterning thin film and substrate-retention tool used for it |
| US6667215B2 (en) * | 2002-05-02 | 2003-12-23 | 3M Innovative Properties | Method of making transistors |
| JP2004103269A (en) * | 2002-09-05 | 2004-04-02 | Sanyo Electric Co Ltd | Manufacture method for organic electroluminescence display device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49118681A (en) * | 1973-03-02 | 1974-11-13 |
-
1978
- 1978-09-22 JP JP11594878A patent/JPS5462984A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49118681A (en) * | 1973-03-02 | 1974-11-13 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02131134A (en) * | 1988-11-12 | 1990-05-18 | Shinku Yakin Kk | Organic ultrafine particle production equipment |
| JPH04116925A (en) * | 1990-09-07 | 1992-04-17 | Kanegafuchi Chem Ind Co Ltd | Method for forming patterning thin film and substrate-retention tool used for it |
| US6667215B2 (en) * | 2002-05-02 | 2003-12-23 | 3M Innovative Properties | Method of making transistors |
| JP2004103269A (en) * | 2002-09-05 | 2004-04-02 | Sanyo Electric Co Ltd | Manufacture method for organic electroluminescence display device |
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