JPS56274A - Continuous vacuum deposition apparatus - Google Patents
Continuous vacuum deposition apparatusInfo
- Publication number
- JPS56274A JPS56274A JP7571279A JP7571279A JPS56274A JP S56274 A JPS56274 A JP S56274A JP 7571279 A JP7571279 A JP 7571279A JP 7571279 A JP7571279 A JP 7571279A JP S56274 A JPS56274 A JP S56274A
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- substrate
- substrates
- supporter
- deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001771 vacuum deposition Methods 0.000 title abstract 5
- 239000000758 substrate Substances 0.000 abstract 11
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 238000001465 metallisation Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7571279A JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7571279A JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS56274A true JPS56274A (en) | 1981-01-06 |
Family
ID=13584120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7571279A Pending JPS56274A (en) | 1979-06-18 | 1979-06-18 | Continuous vacuum deposition apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56274A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2594102A1 (fr) * | 1986-02-12 | 1987-08-14 | Stein Heurtey | Installation flexible automatisee de traitement thermochimique rapide |
| FR2621023A1 (fr) * | 1987-09-24 | 1989-03-31 | Stein Heurtey | Installation automatique de traitement thermochimique rapide |
-
1979
- 1979-06-18 JP JP7571279A patent/JPS56274A/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2594102A1 (fr) * | 1986-02-12 | 1987-08-14 | Stein Heurtey | Installation flexible automatisee de traitement thermochimique rapide |
| FR2621023A1 (fr) * | 1987-09-24 | 1989-03-31 | Stein Heurtey | Installation automatique de traitement thermochimique rapide |
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