JPS5644802A - System and method of measuring film thickness and coating varnish film thickness - Google Patents

System and method of measuring film thickness and coating varnish film thickness

Info

Publication number
JPS5644802A
JPS5644802A JP12027779A JP12027779A JPS5644802A JP S5644802 A JPS5644802 A JP S5644802A JP 12027779 A JP12027779 A JP 12027779A JP 12027779 A JP12027779 A JP 12027779A JP S5644802 A JPS5644802 A JP S5644802A
Authority
JP
Japan
Prior art keywords
film thickness
film
coating varnish
thickness
light source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12027779A
Other languages
Japanese (ja)
Inventor
Hideo Takada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12027779A priority Critical patent/JPS5644802A/en
Publication of JPS5644802A publication Critical patent/JPS5644802A/en
Pending legal-status Critical Current

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Landscapes

  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE: To easily measure the thickness by a method wherein film and the coating varnish film are made to have the transmission. Absorption band for the infrared- ray range.
CONSTITUTION: The irradiation of infrared rays of the specified spot diameter from the reference light source 2 installed under film 1 to be measured transmits through film 1 and is detected by detection head 3 which is disposed above film 1 facing against the reference light source 2. This detected signal is entered into deflection indicator 5 via amplifier 4 to indicate the thickness.
COPYRIGHT: (C)1981,JPO&Japio
JP12027779A 1979-09-20 1979-09-20 System and method of measuring film thickness and coating varnish film thickness Pending JPS5644802A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12027779A JPS5644802A (en) 1979-09-20 1979-09-20 System and method of measuring film thickness and coating varnish film thickness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12027779A JPS5644802A (en) 1979-09-20 1979-09-20 System and method of measuring film thickness and coating varnish film thickness

Publications (1)

Publication Number Publication Date
JPS5644802A true JPS5644802A (en) 1981-04-24

Family

ID=14782246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12027779A Pending JPS5644802A (en) 1979-09-20 1979-09-20 System and method of measuring film thickness and coating varnish film thickness

Country Status (1)

Country Link
JP (1) JPS5644802A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5396332A (en) * 1993-02-08 1995-03-07 Ciszek; Theodoer F. Apparatus and method for measuring the thickness of a semiconductor wafer
JP2008049245A (en) * 2006-08-23 2008-03-06 Fuji Electric Retail Systems Co Ltd Water softener
JP2010025904A (en) * 2008-07-24 2010-02-04 Central Japan Railway Co Coating thickness measurement method
WO2011001968A1 (en) * 2009-07-03 2011-01-06 株式会社シンクロン Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5396332A (en) * 1993-02-08 1995-03-07 Ciszek; Theodoer F. Apparatus and method for measuring the thickness of a semiconductor wafer
JP2008049245A (en) * 2006-08-23 2008-03-06 Fuji Electric Retail Systems Co Ltd Water softener
JP2010025904A (en) * 2008-07-24 2010-02-04 Central Japan Railway Co Coating thickness measurement method
WO2011001968A1 (en) * 2009-07-03 2011-01-06 株式会社シンクロン Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter
JP2011013145A (en) * 2009-07-03 2011-01-20 Shincron:Kk Optical film thickness meter and thin film forming apparatus provided with the optical thickness meter
US8625111B2 (en) 2009-07-03 2014-01-07 Shincron Co., Ltd. Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter

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