JPS5644802A - System and method of measuring film thickness and coating varnish film thickness - Google Patents
System and method of measuring film thickness and coating varnish film thicknessInfo
- Publication number
- JPS5644802A JPS5644802A JP12027779A JP12027779A JPS5644802A JP S5644802 A JPS5644802 A JP S5644802A JP 12027779 A JP12027779 A JP 12027779A JP 12027779 A JP12027779 A JP 12027779A JP S5644802 A JPS5644802 A JP S5644802A
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- film
- coating varnish
- thickness
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 title abstract 2
- 238000000576 coating method Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title abstract 2
- 239000002966 varnish Substances 0.000 title abstract 2
- 238000010521 absorption reaction Methods 0.000 abstract 1
- 230000005540 biological transmission Effects 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12027779A JPS5644802A (en) | 1979-09-20 | 1979-09-20 | System and method of measuring film thickness and coating varnish film thickness |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12027779A JPS5644802A (en) | 1979-09-20 | 1979-09-20 | System and method of measuring film thickness and coating varnish film thickness |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5644802A true JPS5644802A (en) | 1981-04-24 |
Family
ID=14782246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12027779A Pending JPS5644802A (en) | 1979-09-20 | 1979-09-20 | System and method of measuring film thickness and coating varnish film thickness |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5644802A (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5396332A (en) * | 1993-02-08 | 1995-03-07 | Ciszek; Theodoer F. | Apparatus and method for measuring the thickness of a semiconductor wafer |
| JP2008049245A (ja) * | 2006-08-23 | 2008-03-06 | Fuji Electric Retail Systems Co Ltd | 軟水化装置 |
| JP2010025904A (ja) * | 2008-07-24 | 2010-02-04 | Central Japan Railway Co | 膜厚測定方法 |
| WO2011001968A1 (ja) * | 2009-07-03 | 2011-01-06 | 株式会社シンクロン | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
-
1979
- 1979-09-20 JP JP12027779A patent/JPS5644802A/ja active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5396332A (en) * | 1993-02-08 | 1995-03-07 | Ciszek; Theodoer F. | Apparatus and method for measuring the thickness of a semiconductor wafer |
| JP2008049245A (ja) * | 2006-08-23 | 2008-03-06 | Fuji Electric Retail Systems Co Ltd | 軟水化装置 |
| JP2010025904A (ja) * | 2008-07-24 | 2010-02-04 | Central Japan Railway Co | 膜厚測定方法 |
| WO2011001968A1 (ja) * | 2009-07-03 | 2011-01-06 | 株式会社シンクロン | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
| JP2011013145A (ja) * | 2009-07-03 | 2011-01-20 | Shincron:Kk | 光学式膜厚計及び光学式膜厚計を備えた薄膜形成装置 |
| US8625111B2 (en) | 2009-07-03 | 2014-01-07 | Shincron Co., Ltd. | Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter |
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