JPS5648237A - Evacuated gaseous phase reactor - Google Patents

Evacuated gaseous phase reactor

Info

Publication number
JPS5648237A
JPS5648237A JP12503579A JP12503579A JPS5648237A JP S5648237 A JPS5648237 A JP S5648237A JP 12503579 A JP12503579 A JP 12503579A JP 12503579 A JP12503579 A JP 12503579A JP S5648237 A JPS5648237 A JP S5648237A
Authority
JP
Japan
Prior art keywords
reaction
substrate
susceptor
uniform
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12503579A
Other languages
English (en)
Inventor
Yoshifumi Nomura
Hiroo Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12503579A priority Critical patent/JPS5648237A/ja
Publication of JPS5648237A publication Critical patent/JPS5648237A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP12503579A 1979-09-28 1979-09-28 Evacuated gaseous phase reactor Pending JPS5648237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12503579A JPS5648237A (en) 1979-09-28 1979-09-28 Evacuated gaseous phase reactor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12503579A JPS5648237A (en) 1979-09-28 1979-09-28 Evacuated gaseous phase reactor

Publications (1)

Publication Number Publication Date
JPS5648237A true JPS5648237A (en) 1981-05-01

Family

ID=14900226

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12503579A Pending JPS5648237A (en) 1979-09-28 1979-09-28 Evacuated gaseous phase reactor

Country Status (1)

Country Link
JP (1) JPS5648237A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956576A (ja) * 1982-08-27 1984-04-02 Yokogawa Hewlett Packard Ltd 薄膜形成方法
US4590024A (en) * 1984-03-29 1986-05-20 Solavolt International Silicon deposition process
US4596208A (en) * 1984-11-05 1986-06-24 Spire Corporation CVD reaction chamber
US4627803A (en) * 1983-08-31 1986-12-09 Junichi Umetsu Apparatus for producing polyacetylene film
US5104690A (en) * 1990-06-06 1992-04-14 Spire Corporation CVD thin film compounds

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5956576A (ja) * 1982-08-27 1984-04-02 Yokogawa Hewlett Packard Ltd 薄膜形成方法
US4627803A (en) * 1983-08-31 1986-12-09 Junichi Umetsu Apparatus for producing polyacetylene film
US4590024A (en) * 1984-03-29 1986-05-20 Solavolt International Silicon deposition process
US4596208A (en) * 1984-11-05 1986-06-24 Spire Corporation CVD reaction chamber
US5104690A (en) * 1990-06-06 1992-04-14 Spire Corporation CVD thin film compounds

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