JPS5659236A - Photoresist developing method - Google Patents

Photoresist developing method

Info

Publication number
JPS5659236A
JPS5659236A JP13546879A JP13546879A JPS5659236A JP S5659236 A JPS5659236 A JP S5659236A JP 13546879 A JP13546879 A JP 13546879A JP 13546879 A JP13546879 A JP 13546879A JP S5659236 A JPS5659236 A JP S5659236A
Authority
JP
Japan
Prior art keywords
film
substrate
photoresist film
photoresist
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13546879A
Other languages
Japanese (ja)
Other versions
JPS6335010B2 (en
Inventor
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP13546879A priority Critical patent/JPS5659236A/en
Publication of JPS5659236A publication Critical patent/JPS5659236A/en
Publication of JPS6335010B2 publication Critical patent/JPS6335010B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To uniformly develop a photoresist film and to enable a precise pattern to be formed exactly, by developing the photoresist film after subjecting the photoresist film, coated on the surface of the substrate to be treated, to exposure and sur- face treatment. CONSTITUTION:Photoresist film 3 to be used as a mask in photoetching is provided by forming film 2 to be processed, such as SiO2 on substrate 1 to be processed of a semiconductive substrate or the like, and forming a given pattern on film 2 in the photochemical process for preparing semiconductor elements. Film 3 is subjected to exposure, and surface layer 3'' of film 3 in a state difficult to react with a developing solution is treated for example with an aqueous 50% ethyl alcohol solution to improve the above state and to remove foreign matters, such as minute dust. Opening 6 is formed by dipping it in the developing solution, washing and drying it, opening 7 is formed by etching film 2 using film 3 as a mask, and film 3 is removed.
JP13546879A 1979-10-19 1979-10-19 Photoresist developing method Granted JPS5659236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13546879A JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13546879A JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Publications (2)

Publication Number Publication Date
JPS5659236A true JPS5659236A (en) 1981-05-22
JPS6335010B2 JPS6335010B2 (en) 1988-07-13

Family

ID=15152411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13546879A Granted JPS5659236A (en) 1979-10-19 1979-10-19 Photoresist developing method

Country Status (1)

Country Link
JP (1) JPS5659236A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008071984A (en) * 2006-09-15 2008-03-27 Tokyo Electron Ltd Exposure and development processing methods

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008071984A (en) * 2006-09-15 2008-03-27 Tokyo Electron Ltd Exposure and development processing methods

Also Published As

Publication number Publication date
JPS6335010B2 (en) 1988-07-13

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