JPS565973A - Film forming method - Google Patents

Film forming method

Info

Publication number
JPS565973A
JPS565973A JP8209279A JP8209279A JPS565973A JP S565973 A JPS565973 A JP S565973A JP 8209279 A JP8209279 A JP 8209279A JP 8209279 A JP8209279 A JP 8209279A JP S565973 A JPS565973 A JP S565973A
Authority
JP
Japan
Prior art keywords
supporter
electrode
film
chamber
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8209279A
Other languages
Japanese (ja)
Other versions
JPS6257711B2 (en
Inventor
Hidekazu Inoue
Isamu Shimizu
Kyosuke Ogawa
Nobuo Kitajima
Tadaharu Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP8209279A priority Critical patent/JPS565973A/en
Publication of JPS565973A publication Critical patent/JPS565973A/en
Publication of JPS6257711B2 publication Critical patent/JPS6257711B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To form a uniform film of large area by arranging many wire discharge electrodes in an evacuatable deposition chamber in parallel with a movable supporter and inducing dishcarge between the adjacent wires while introducing a reactive gas. CONSTITUTION:A film of large area is formed with high reproducibility and uniformity in its physical characteristics and thickness over the whole surface. For example, deposition chamber 103 is internally provided with film forming beltlike supporter 104 which is coiled with roller 107, gas supplying means 110 for supplying a gas into chamber 103, and discharge electrode 109. Electrode 109 is composed of many wire electrodes which have been divided into A group 108-1 and B group 108-2 and arranged in parallel with supporter 104 so that an electric field is formed between the adjacent wires to charge electrode 109 with electric energy. Chamber 1-3 is evacuated, a reactive gas is introduced with means 110, and discharge is induced between the electrodes. Supporter 104 with a film formed is coiled with roller 107 so that it is moved relatively to electrode 109.
JP8209279A 1979-06-27 1979-06-27 Film forming method Granted JPS565973A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8209279A JPS565973A (en) 1979-06-27 1979-06-27 Film forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8209279A JPS565973A (en) 1979-06-27 1979-06-27 Film forming method

Publications (2)

Publication Number Publication Date
JPS565973A true JPS565973A (en) 1981-01-22
JPS6257711B2 JPS6257711B2 (en) 1987-12-02

Family

ID=13764783

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8209279A Granted JPS565973A (en) 1979-06-27 1979-06-27 Film forming method

Country Status (1)

Country Link
JP (1) JPS565973A (en)

Also Published As

Publication number Publication date
JPS6257711B2 (en) 1987-12-02

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