JPS566437A - Alignment - Google Patents
AlignmentInfo
- Publication number
- JPS566437A JPS566437A JP8040279A JP8040279A JPS566437A JP S566437 A JPS566437 A JP S566437A JP 8040279 A JP8040279 A JP 8040279A JP 8040279 A JP8040279 A JP 8040279A JP S566437 A JPS566437 A JP S566437A
- Authority
- JP
- Japan
- Prior art keywords
- alignment
- wafer
- fixed
- groove
- key
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8040279A JPS566437A (en) | 1979-06-26 | 1979-06-26 | Alignment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8040279A JPS566437A (en) | 1979-06-26 | 1979-06-26 | Alignment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS566437A true JPS566437A (en) | 1981-01-23 |
Family
ID=13717287
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8040279A Pending JPS566437A (en) | 1979-06-26 | 1979-06-26 | Alignment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS566437A (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183033A (en) * | 1981-05-06 | 1982-11-11 | Toshiba Corp | Method for wafer exposure and device thereof |
| US20120225538A1 (en) * | 2011-03-03 | 2012-09-06 | Minjung Kim | Methods of disposing alignment keys and methods of fabricating semiconductor chips using the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179582A (en) * | 1975-01-07 | 1976-07-10 | Canon Kk | Araimentoyokii pataanhogohoho |
| JPS5230384A (en) * | 1975-09-03 | 1977-03-08 | Siemens Ag | Method of automatically adjusting semiconductor plates |
| JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
-
1979
- 1979-06-26 JP JP8040279A patent/JPS566437A/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5179582A (en) * | 1975-01-07 | 1976-07-10 | Canon Kk | Araimentoyokii pataanhogohoho |
| JPS5230384A (en) * | 1975-09-03 | 1977-03-08 | Siemens Ag | Method of automatically adjusting semiconductor plates |
| JPS5356975A (en) * | 1976-11-01 | 1978-05-23 | Hitachi Ltd | Exposure apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57183033A (en) * | 1981-05-06 | 1982-11-11 | Toshiba Corp | Method for wafer exposure and device thereof |
| US20120225538A1 (en) * | 2011-03-03 | 2012-09-06 | Minjung Kim | Methods of disposing alignment keys and methods of fabricating semiconductor chips using the same |
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