JPS5670635A - Rotatable coating method and device therefor - Google Patents

Rotatable coating method and device therefor

Info

Publication number
JPS5670635A
JPS5670635A JP14841379A JP14841379A JPS5670635A JP S5670635 A JPS5670635 A JP S5670635A JP 14841379 A JP14841379 A JP 14841379A JP 14841379 A JP14841379 A JP 14841379A JP S5670635 A JPS5670635 A JP S5670635A
Authority
JP
Japan
Prior art keywords
photoresist
liquid
substrate
coated
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14841379A
Other languages
Japanese (ja)
Other versions
JPS5914891B2 (en
Inventor
Hiroshi Kuroda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP54148413A priority Critical patent/JPS5914891B2/en
Publication of JPS5670635A publication Critical patent/JPS5670635A/en
Publication of JPS5914891B2 publication Critical patent/JPS5914891B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To enable uniform coating of a photoresist including no foreign material in resin by directing downwardly the surface to be coated of a semiconductor substrate, bringing the substrate into contact with the resin liquid surface within a container to which supersonic vibration is applied, isolating both and rotating the substrate. CONSTITUTION:The semiconductor substrate 21 is so set at a wafer chuck 23 connected to a motor 24 that the surface to be coated becomes downside, the chuck is lowered, and is brought more than once into contact with the liquid surface 28 of the photoresist liquid 25 being uneven by a supersonic vibration generator 27 mounted on the lower surface of the tank 26. Subsequently, the substrate 21 is isolated from the photoresist 25, the motor 24 is rotated, and a photoresist film is coated thereon. Since foreign material adhered onto the wafer can be thus removed and the liquid is sufficiently filled via the uneven surface of the liquid even in the recess on the surface of the wafer, the photoresist can be uniformly coated thereon.
JP54148413A 1979-11-15 1979-11-15 Spin coating method and spin coating device Expired JPS5914891B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP54148413A JPS5914891B2 (en) 1979-11-15 1979-11-15 Spin coating method and spin coating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP54148413A JPS5914891B2 (en) 1979-11-15 1979-11-15 Spin coating method and spin coating device

Publications (2)

Publication Number Publication Date
JPS5670635A true JPS5670635A (en) 1981-06-12
JPS5914891B2 JPS5914891B2 (en) 1984-04-06

Family

ID=15452230

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54148413A Expired JPS5914891B2 (en) 1979-11-15 1979-11-15 Spin coating method and spin coating device

Country Status (1)

Country Link
JP (1) JPS5914891B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633615A1 (en) * 1993-07-05 1995-01-11 Sharp Kabushiki Kaisha Resin coating method for a semiconductor laser chip and photodiode chips
CN113341654A (en) * 2020-02-18 2021-09-03 长鑫存储技术有限公司 Photoresist supply device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60186344U (en) * 1984-05-23 1985-12-10 スタ−ロイ産業株式会社 Katsuturbit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0633615A1 (en) * 1993-07-05 1995-01-11 Sharp Kabushiki Kaisha Resin coating method for a semiconductor laser chip and photodiode chips
CN113341654A (en) * 2020-02-18 2021-09-03 长鑫存储技术有限公司 Photoresist supply device
CN113341654B (en) * 2020-02-18 2023-02-28 长鑫存储技术有限公司 A photoresist supply device
US12078930B2 (en) 2020-02-18 2024-09-03 Changxin Memory Technologies, Inc. Photoresist feeding device

Also Published As

Publication number Publication date
JPS5914891B2 (en) 1984-04-06

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