JPS5686343A - Method for ion microanalysis - Google Patents
Method for ion microanalysisInfo
- Publication number
- JPS5686343A JPS5686343A JP16346479A JP16346479A JPS5686343A JP S5686343 A JPS5686343 A JP S5686343A JP 16346479 A JP16346479 A JP 16346479A JP 16346479 A JP16346479 A JP 16346479A JP S5686343 A JPS5686343 A JP S5686343A
- Authority
- JP
- Japan
- Prior art keywords
- equal
- gaseous
- oxygen
- gas
- gaseous argon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE:To improve both the detecting sensitivity of ion microanalysis and the rate of sputter etching, by using gaseous argon admixed with a suitable quantity of gaseous oxygen. CONSTITUTION:Gaseous argon admixed with 3-20vol% oxygen is used as the gas for generating ions. Using of said gas makes it possible to perform analysis with equal detection sensitivity to that when pure gaseous oxygen is used and with equal rate of sputter etching to that when pure gaseous argon is used. Using of said gas allows in addition to reduce the oxidation and consumption of cathode placed in the chamber where ions are generated, hence the durable time of the electric discharge is equal to that when pure gaseous argon is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16346479A JPS5686343A (en) | 1979-12-18 | 1979-12-18 | Method for ion microanalysis |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16346479A JPS5686343A (en) | 1979-12-18 | 1979-12-18 | Method for ion microanalysis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5686343A true JPS5686343A (en) | 1981-07-14 |
Family
ID=15774366
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16346479A Pending JPS5686343A (en) | 1979-12-18 | 1979-12-18 | Method for ion microanalysis |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5686343A (en) |
-
1979
- 1979-12-18 JP JP16346479A patent/JPS5686343A/en active Pending
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