JPS5686343A - Method for ion microanalysis - Google Patents

Method for ion microanalysis

Info

Publication number
JPS5686343A
JPS5686343A JP16346479A JP16346479A JPS5686343A JP S5686343 A JPS5686343 A JP S5686343A JP 16346479 A JP16346479 A JP 16346479A JP 16346479 A JP16346479 A JP 16346479A JP S5686343 A JPS5686343 A JP S5686343A
Authority
JP
Japan
Prior art keywords
equal
gaseous
oxygen
gas
gaseous argon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16346479A
Other languages
Japanese (ja)
Inventor
Takashi Furusawa
Hiroko Konno
Yasuo Udou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16346479A priority Critical patent/JPS5686343A/en
Publication of JPS5686343A publication Critical patent/JPS5686343A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To improve both the detecting sensitivity of ion microanalysis and the rate of sputter etching, by using gaseous argon admixed with a suitable quantity of gaseous oxygen. CONSTITUTION:Gaseous argon admixed with 3-20vol% oxygen is used as the gas for generating ions. Using of said gas makes it possible to perform analysis with equal detection sensitivity to that when pure gaseous oxygen is used and with equal rate of sputter etching to that when pure gaseous argon is used. Using of said gas allows in addition to reduce the oxidation and consumption of cathode placed in the chamber where ions are generated, hence the durable time of the electric discharge is equal to that when pure gaseous argon is used.
JP16346479A 1979-12-18 1979-12-18 Method for ion microanalysis Pending JPS5686343A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16346479A JPS5686343A (en) 1979-12-18 1979-12-18 Method for ion microanalysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16346479A JPS5686343A (en) 1979-12-18 1979-12-18 Method for ion microanalysis

Publications (1)

Publication Number Publication Date
JPS5686343A true JPS5686343A (en) 1981-07-14

Family

ID=15774366

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16346479A Pending JPS5686343A (en) 1979-12-18 1979-12-18 Method for ion microanalysis

Country Status (1)

Country Link
JP (1) JPS5686343A (en)

Similar Documents

Publication Publication Date Title
GB1523550A (en) Gas component sensor
TW346645B (en) Method and device for introducing impurity and manufacture of semiconductor device
JPS57201527A (en) Ion implantation method
JPS51134189A (en) Measuring method of the total carbon volume
EP0335666A3 (en) Unitary dual gas sensors
GB913956A (en) Improvements in and relating to ion sources
JPS5343594A (en) Ion source for chemical ionization
GB929883A (en) Improvements in or relating to the detection and/or analysis of low concentrations of gases and vapour
JPS5686343A (en) Method for ion microanalysis
JPS5271293A (en) Oxygen concentration meter
JPS5512632A (en) Ion source device for mass spectrometer
JPS51111387A (en) Electrochemical detector of gas concentration
JPS5320769A (en) Plasma etching method of metal electrodes
JPS5381289A (en) Ion-molecule reaction mass spectrometer
JPS572585A (en) Forming method for aluminum electrode
JPS5310491A (en) Oxygen concentration detector
JPS52120894A (en) Structure of air-fuel ratio detector with three electrodes
JPS5255591A (en) Oxygen concentration detector in exhaust gas
GB1462928A (en) Process for the surface treatment of a metallographic sample by means of cathodic ion and gas etching
JPS5284795A (en) Analyzer using ion selective electrode
JPS5772235A (en) Transparent electrode and production thereof
JPS5698475A (en) Forming method for thin film of fluoro-resin
JPS526596A (en) Detector for gas chromatograph
JPS5267390A (en) Oxygen concentration detector
JPS53114661A (en) Ion source of penning discharge type