JPS5693320A - Method for pattern formation - Google Patents

Method for pattern formation

Info

Publication number
JPS5693320A
JPS5693320A JP16916279A JP16916279A JPS5693320A JP S5693320 A JPS5693320 A JP S5693320A JP 16916279 A JP16916279 A JP 16916279A JP 16916279 A JP16916279 A JP 16916279A JP S5693320 A JPS5693320 A JP S5693320A
Authority
JP
Japan
Prior art keywords
resist
mark
pattern
formation
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16916279A
Other languages
Japanese (ja)
Inventor
Fumio Yamagishi
Yuji Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP16916279A priority Critical patent/JPS5693320A/en
Publication of JPS5693320A publication Critical patent/JPS5693320A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W46/00—Marks applied to devices, e.g. for alignment or identification

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To reduce the process of work as well as to cut down the cost price by a method wherein the resist which was used for the formation of marks is made usable again for the formation of device patterns by forming metal marks with plating. CONSTITUTION:A positive type resist 3 is applied and baked on the metal conductive layer 2 of a substrate 1. Then a concaved section 4, having the exposed layer 2, is formed by performing the exposure and developing processes of the mark pattern and then removing the resist from the section where the mark will be formed. Then a metal mark 5 is formed on the concaved section 4 by performing plating. Then the device pattern is positioned on the resist 2 and a resist pattern 6, whereon the resist on the section corresponding to the device pattern has been removed by exposure and developing the device pattern, is formed. As a result, the resist which was used for the mark can be used again for the formation of the device pattern, without exfoliation, thereby allowing to reduce the process of work as well as to cut down the cost price.
JP16916279A 1979-12-27 1979-12-27 Method for pattern formation Pending JPS5693320A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16916279A JPS5693320A (en) 1979-12-27 1979-12-27 Method for pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16916279A JPS5693320A (en) 1979-12-27 1979-12-27 Method for pattern formation

Publications (1)

Publication Number Publication Date
JPS5693320A true JPS5693320A (en) 1981-07-28

Family

ID=15881413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16916279A Pending JPS5693320A (en) 1979-12-27 1979-12-27 Method for pattern formation

Country Status (1)

Country Link
JP (1) JPS5693320A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272720A (en) * 1985-05-28 1986-12-03 Seiko Instr & Electronics Ltd Production of color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61272720A (en) * 1985-05-28 1986-12-03 Seiko Instr & Electronics Ltd Production of color filter

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