JPS57140318A - Manufacture of substrate having stuck electrically conductive transparent film - Google Patents

Manufacture of substrate having stuck electrically conductive transparent film

Info

Publication number: JPS57140318A
Authority: JP; Japan
Prior art keywords: vacuum; in2o3; substrate; sno; deposited
Prior art date: 1981-02-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP2564781A

Other languages

English (en)

Inventor

Shozaburo Nishikawa

Hiroshi Ikeizumi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nippon Sheet Glass Co Ltd

Original Assignee

Nippon Sheet Glass Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-02-24

Filing date

1981-02-24

Publication date

1982-08-30

1981-02-24 Application filed by Nippon Sheet Glass Co Ltd filed Critical Nippon Sheet Glass Co Ltd

1981-02-24 Priority to JP2564781A priority Critical patent/JPS57140318A/ja

1982-08-30 Publication of JPS57140318A publication Critical patent/JPS57140318A/ja

Status Pending legal-status Critical Current

Links

239000000758 substrate Substances 0.000 title abstract 3
238000004519 manufacturing process Methods 0.000 title 1
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 abstract 4
239000013078 crystal Substances 0.000 abstract 2
239000011521 glass Substances 0.000 abstract 2
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 abstract 1
KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 abstract 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
229910052801 chlorine Inorganic materials 0.000 abstract 1
239000000460 chlorine Substances 0.000 abstract 1
230000002542 deteriorative effect Effects 0.000 abstract 1
RJGHQTVXGKYATR-UHFFFAOYSA-L dibutyl(dichloro)stannane Chemical compound CCCC[Sn](Cl)(Cl)CCCC RJGHQTVXGKYATR-UHFFFAOYSA-L 0.000 abstract 1
PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 abstract 1
239000000203 mixture Substances 0.000 abstract 1
239000007858 starting material Substances 0.000 abstract 1
YJBKVPRVZAQTPY-UHFFFAOYSA-J tetrachlorostannane;dihydrate Chemical compound O.O.Cl[Sn](Cl)(Cl)Cl YJBKVPRVZAQTPY-UHFFFAOYSA-J 0.000 abstract 1
238000001771 vacuum deposition Methods 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

Chemical & Material Sciences (AREA)
Liquid Crystal (AREA)
Mechanical Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
General Chemical & Material Sciences (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Physical Vapour Deposition (AREA)
Manufacturing Of Electric Cables (AREA)
Inorganic Chemistry (AREA)
Surface Treatment Of Glass (AREA)

JP2564781A 1981-02-24 1981-02-24 Manufacture of substrate having stuck electrically conductive transparent film Pending JPS57140318A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP2564781A JPS57140318A (en)	1981-02-24	1981-02-24	Manufacture of substrate having stuck electrically conductive transparent film

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2564781A JPS57140318A (en)	1981-02-24	1981-02-24	Manufacture of substrate having stuck electrically conductive transparent film

Publications (1)

Publication Number	Publication Date
JPS57140318A true JPS57140318A (en)	1982-08-30

Family

ID=12171614

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2564781A Pending JPS57140318A (en)	1981-02-24	1981-02-24	Manufacture of substrate having stuck electrically conductive transparent film

Country Status (1)

Country	Link
JP (1)	JPS57140318A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0247256A (ja) *	1988-06-22	1990-02-16	Boc Group Inc:The	反応形スパッタリングによる酸化物膜の形成
US4975388A (en) *	1988-06-03	1990-12-04	U.S. Philips Corporation	Method of forming epitaxial layers
JPH07274646A (ja) *	1995-02-07	1995-10-24	Iseki & Co Ltd	施肥装置付き乗用型田植機

1981
- 1981-02-24 JP JP2564781A patent/JPS57140318A/ja active Pending

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4975388A (en) *	1988-06-03	1990-12-04	U.S. Philips Corporation	Method of forming epitaxial layers
JPH0247256A (ja) *	1988-06-22	1990-02-16	Boc Group Inc:The	反応形スパッタリングによる酸化物膜の形成
JPH07274646A (ja) *	1995-02-07	1995-10-24	Iseki & Co Ltd	施肥装置付き乗用型田植機

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