JPS57207335A - Pattern checking system - Google Patents

Pattern checking system

Info

Publication number
JPS57207335A
JPS57207335A JP9180181A JP9180181A JPS57207335A JP S57207335 A JPS57207335 A JP S57207335A JP 9180181 A JP9180181 A JP 9180181A JP 9180181 A JP9180181 A JP 9180181A JP S57207335 A JPS57207335 A JP S57207335A
Authority
JP
Japan
Prior art keywords
pattern
checked
chip
patterns
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9180181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6239812B2 (fr
Inventor
Kenichi Kobayashi
Yoshimitsu Majima
Shogo Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9180181A priority Critical patent/JPS57207335A/ja
Publication of JPS57207335A publication Critical patent/JPS57207335A/ja
Publication of JPS6239812B2 publication Critical patent/JPS6239812B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP9180181A 1981-06-15 1981-06-15 Pattern checking system Granted JPS57207335A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9180181A JPS57207335A (en) 1981-06-15 1981-06-15 Pattern checking system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9180181A JPS57207335A (en) 1981-06-15 1981-06-15 Pattern checking system

Publications (2)

Publication Number Publication Date
JPS57207335A true JPS57207335A (en) 1982-12-20
JPS6239812B2 JPS6239812B2 (fr) 1987-08-25

Family

ID=14036714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9180181A Granted JPS57207335A (en) 1981-06-15 1981-06-15 Pattern checking system

Country Status (1)

Country Link
JP (1) JPS57207335A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827323A (ja) * 1981-08-12 1983-02-18 Hitachi Ltd マスク検査方法および装置
JPS596536A (ja) * 1982-07-05 1984-01-13 Hitachi Ltd 欠陥検査装置
JPS63260147A (ja) * 1987-04-17 1988-10-27 Nec Corp パタ−ン検証方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS54102837A (en) * 1978-01-28 1979-08-13 Nippon Telegr & Teleph Corp <Ntt> Pattern check system
JPS54113262A (en) * 1978-02-24 1979-09-04 Hitachi Ltd Mask inspection unit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53117978A (en) * 1977-03-25 1978-10-14 Hitachi Ltd Automatic mask appearance inspection apparatus
JPS54102837A (en) * 1978-01-28 1979-08-13 Nippon Telegr & Teleph Corp <Ntt> Pattern check system
JPS54113262A (en) * 1978-02-24 1979-09-04 Hitachi Ltd Mask inspection unit

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5827323A (ja) * 1981-08-12 1983-02-18 Hitachi Ltd マスク検査方法および装置
JPS596536A (ja) * 1982-07-05 1984-01-13 Hitachi Ltd 欠陥検査装置
JPS63260147A (ja) * 1987-04-17 1988-10-27 Nec Corp パタ−ン検証方法

Also Published As

Publication number Publication date
JPS6239812B2 (fr) 1987-08-25

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