JPS5724563A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS5724563A JPS5724563A JP9953180A JP9953180A JPS5724563A JP S5724563 A JPS5724563 A JP S5724563A JP 9953180 A JP9953180 A JP 9953180A JP 9953180 A JP9953180 A JP 9953180A JP S5724563 A JPS5724563 A JP S5724563A
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- polycrystalline
- dielectric strength
- metal
- mosic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/911—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using passive elements as protective elements
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Protection Of Static Devices (AREA)
- Amplifiers (AREA)
Abstract
PURPOSE:To improve the static dielectric strength of an MOSIC, by arranging a metal contacting with the curved or bent part of the protective polycrystalline Si resistor formed on a semiconductor substrate through an insulating film. CONSTITUTION:A polycrystalline Si resistor 3 is formed on an Si substrate on which an MOS type device has been formed, through an insulating film. One end of the resistor 3 is connected to a metal electrode 1 for bonding through a connector 2, while other end is connected to an input protective circuit wiring 6 through a connector 5. Moreover, a metal 11 of Al and the like is contacted with the curved part of the polycrystalline Si resistor 3. Thus, the dielectric strength of the polycrystalline Si resistor itself is made approximately equal to that of a liner polycrystalline Si resistor in level, and the static dielectric strength of the MOSIC is improved without changing the layout and the manufacturing process of the circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9953180A JPS5724563A (en) | 1980-07-21 | 1980-07-21 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9953180A JPS5724563A (en) | 1980-07-21 | 1980-07-21 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5724563A true JPS5724563A (en) | 1982-02-09 |
| JPS626673B2 JPS626673B2 (en) | 1987-02-12 |
Family
ID=14249794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9953180A Granted JPS5724563A (en) | 1980-07-21 | 1980-07-21 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5724563A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59105369A (en) * | 1982-12-07 | 1984-06-18 | Seiko Epson Corp | Semiconductor device |
| JPS61100969A (en) * | 1984-10-22 | 1986-05-19 | Nec Corp | Insulated gate protection semiconductor device |
| US4713680A (en) * | 1986-06-30 | 1987-12-15 | Motorola, Inc. | Series resistive network |
| JPH01149451A (en) * | 1987-12-04 | 1989-06-12 | Rohm Co Ltd | Protective device for cmos input stage gate |
| US5113230A (en) * | 1982-02-22 | 1992-05-12 | Tokyo Shibaura Denki Kabushi Kaisha | Semiconductor device having a conductive layer for preventing insulation layer destruction |
| JPH0590521A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
| JPH0590522A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
| JPH0590523A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
-
1980
- 1980-07-21 JP JP9953180A patent/JPS5724563A/en active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5113230A (en) * | 1982-02-22 | 1992-05-12 | Tokyo Shibaura Denki Kabushi Kaisha | Semiconductor device having a conductive layer for preventing insulation layer destruction |
| JPS59105369A (en) * | 1982-12-07 | 1984-06-18 | Seiko Epson Corp | Semiconductor device |
| JPS61100969A (en) * | 1984-10-22 | 1986-05-19 | Nec Corp | Insulated gate protection semiconductor device |
| US4713680A (en) * | 1986-06-30 | 1987-12-15 | Motorola, Inc. | Series resistive network |
| JPH01149451A (en) * | 1987-12-04 | 1989-06-12 | Rohm Co Ltd | Protective device for cmos input stage gate |
| JPH0590521A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
| JPH0590522A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
| JPH0590523A (en) * | 1992-03-16 | 1993-04-09 | Seiko Epson Corp | Semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS626673B2 (en) | 1987-02-12 |
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