JPS5739171A - Film thickness monitoring apparatus in vapor deposition apparatus - Google Patents
Film thickness monitoring apparatus in vapor deposition apparatusInfo
- Publication number
- JPS5739171A JPS5739171A JP11346780A JP11346780A JPS5739171A JP S5739171 A JPS5739171 A JP S5739171A JP 11346780 A JP11346780 A JP 11346780A JP 11346780 A JP11346780 A JP 11346780A JP S5739171 A JPS5739171 A JP S5739171A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- shutter
- film thickness
- monitor
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007740 vapor deposition Methods 0.000 title abstract 14
- 238000012544 monitoring process Methods 0.000 title abstract 3
- 239000013078 crystal Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To extend the life of a monitoring apparatus and to form a uniform film thickness by a method wherein a crystal oscillator type monitor for controlling a vapor deposition film thickness and a timer for setting a vapor deposition time in a vapor deposition apparatus to CPU and the film thickness is controlled by cooperative driving thereof. CONSTITUTION:In the vapor deposition apparatus 1, a crystal oscillator type monitor 6 monitoring a vapor deposition speed is connected to CPU8 and said CPU8 controls an operation time of a timer 9 corresponding to the vapor deposition speed from the monitor 6 to set an opening and closing operation time of a shutter 10 above a vapor deposition source 2 as well as to control the opening and the closing of said shutter 7. That is, at a certain time of vapor deposition, the shutter 7 is opened to confirm a vapor deposition speed by the monitor 6 and, thereafter, the shutter 7 is closed so as to prevent entrance of vapor deposition particle. The vapor deposition speed confirmed by the monitor 6 is applied to the CPU8 to calculate a vapor deposition time and, corresponding to this time, the timer 9 is operated to open and close the shutter 10 and, thereby, a thickness of a vapor deposition film against a substrate plate 5 is controlled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11346780A JPS5739171A (en) | 1980-08-20 | 1980-08-20 | Film thickness monitoring apparatus in vapor deposition apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11346780A JPS5739171A (en) | 1980-08-20 | 1980-08-20 | Film thickness monitoring apparatus in vapor deposition apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5739171A true JPS5739171A (en) | 1982-03-04 |
| JPS643946B2 JPS643946B2 (en) | 1989-01-24 |
Family
ID=14612979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11346780A Granted JPS5739171A (en) | 1980-08-20 | 1980-08-20 | Film thickness monitoring apparatus in vapor deposition apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5739171A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57153208A (en) * | 1981-03-17 | 1982-09-21 | Mitsubishi Electric Corp | Chemical vapor growth device |
| JPS58174804A (en) * | 1982-04-07 | 1983-10-13 | Matsushita Electric Ind Co Ltd | Film thickness measuring device |
| KR100600880B1 (en) | 2004-10-05 | 2006-07-18 | 삼성에스디아이 주식회사 | Vacuum evaporator |
| KR100684739B1 (en) | 2005-11-22 | 2007-02-20 | 삼성에스디아이 주식회사 | Organic material deposition apparatus |
| KR100709265B1 (en) * | 2005-11-22 | 2007-04-19 | 삼성에스디아이 주식회사 | Organic material deposition apparatus and deposition method |
-
1980
- 1980-08-20 JP JP11346780A patent/JPS5739171A/en active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57153208A (en) * | 1981-03-17 | 1982-09-21 | Mitsubishi Electric Corp | Chemical vapor growth device |
| JPS58174804A (en) * | 1982-04-07 | 1983-10-13 | Matsushita Electric Ind Co Ltd | Film thickness measuring device |
| KR100600880B1 (en) | 2004-10-05 | 2006-07-18 | 삼성에스디아이 주식회사 | Vacuum evaporator |
| KR100684739B1 (en) | 2005-11-22 | 2007-02-20 | 삼성에스디아이 주식회사 | Organic material deposition apparatus |
| KR100709265B1 (en) * | 2005-11-22 | 2007-04-19 | 삼성에스디아이 주식회사 | Organic material deposition apparatus and deposition method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS643946B2 (en) | 1989-01-24 |
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