JPS648265A - Method for controlling evaporation rate of vacuum deposition device - Google Patents
Method for controlling evaporation rate of vacuum deposition deviceInfo
- Publication number
- JPS648265A JPS648265A JP16085887A JP16085887A JPS648265A JP S648265 A JPS648265 A JP S648265A JP 16085887 A JP16085887 A JP 16085887A JP 16085887 A JP16085887 A JP 16085887A JP S648265 A JPS648265 A JP S648265A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- opening degree
- vapor
- heater
- heater power
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008020 evaporation Effects 0.000 title abstract 7
- 238000001704 evaporation Methods 0.000 title abstract 7
- 238000001771 vacuum deposition Methods 0.000 title abstract 2
- 238000000034 method Methods 0.000 title 1
- 239000002184 metal Substances 0.000 abstract 3
- 238000009499 grossing Methods 0.000 abstract 1
- 230000004043 responsiveness Effects 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 238000004804 winding Methods 0.000 abstract 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To control an evaporation rate with high responsiveness and to execute good vapor deposition on a strip by detecting a shutter opening degree, controlling the opening degree and controlling the heater power of an evaporation vessel according to the opening degree. CONSTITUTION:A metal bath 1 in the evaporation bath vessel 2 is heated by a heater 4 and generated metal vapor 3 is introduced through a shutter 8 installed at a vapor flow port 5 into a channel 6 where the vapor is deposited by evaporation on the strip 7 traveling on a winding roll 11. The opening control of the above-mentioned shutter 8 is controlled by a shutter opening degree controller 15 according to the thickness of the vapor deposited film on the strip 7 by which the evaporation of the metal vapor 3 is instantaneously controller with the above-mentioned continuous vacuum deposition device. The heater power A is controlled in accordance with the target value C of the evaporation rate to obtain a heat balance. The shutter opening degree is detected at this time and the above-mentioned heater power A is applied to the heat if the deviation between the detected value F and the prescribed value E is within a permissible range. The heater capacity, i.e., the min heater power or the max. heater power subjected to a smoothing treatment is applied to the heater when the above- mentioned deviation exceeds the permissible range.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16085887A JPS648265A (en) | 1987-06-30 | 1987-06-30 | Method for controlling evaporation rate of vacuum deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16085887A JPS648265A (en) | 1987-06-30 | 1987-06-30 | Method for controlling evaporation rate of vacuum deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS648265A true JPS648265A (en) | 1989-01-12 |
Family
ID=15723902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16085887A Pending JPS648265A (en) | 1987-06-30 | 1987-06-30 | Method for controlling evaporation rate of vacuum deposition device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS648265A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6465257A (en) * | 1987-09-07 | 1989-03-10 | Mitsubishi Heavy Ind Ltd | Method for controlling amount of evaporation in vacuum deposition device |
| KR100392070B1 (en) * | 2000-11-27 | 2003-07-23 | 주식회사 미래엔지니어링 | A waste-water Treatment system using titanium dioxide as catalyst which immobilized with Sol-gel method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60251273A (en) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum depositing apparatus |
| JPS62267471A (en) * | 1986-05-16 | 1987-11-20 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum deposition apparatus |
-
1987
- 1987-06-30 JP JP16085887A patent/JPS648265A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60251273A (en) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum depositing apparatus |
| JPS62267471A (en) * | 1986-05-16 | 1987-11-20 | Mitsubishi Heavy Ind Ltd | Method for controlling extent of evaporation in vacuum deposition apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6465257A (en) * | 1987-09-07 | 1989-03-10 | Mitsubishi Heavy Ind Ltd | Method for controlling amount of evaporation in vacuum deposition device |
| KR100392070B1 (en) * | 2000-11-27 | 2003-07-23 | 주식회사 미래엔지니어링 | A waste-water Treatment system using titanium dioxide as catalyst which immobilized with Sol-gel method |
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