JPS574173A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS574173A JPS574173A JP7859680A JP7859680A JPS574173A JP S574173 A JPS574173 A JP S574173A JP 7859680 A JP7859680 A JP 7859680A JP 7859680 A JP7859680 A JP 7859680A JP S574173 A JPS574173 A JP S574173A
- Authority
- JP
- Japan
- Prior art keywords
- regions
- type
- junctions
- receiving light
- boron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/186—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors having arrangements for blooming suppression
Landscapes
- Light Receiving Elements (AREA)
Abstract
PURPOSE:To prevent the generation of a blooming by forming resistance regions with one conduction type to a region existing between adjacent P-N junctions for receiving light and regions existing among the P-N junctions for receiving light and the storing reading circuits. CONSTITUTION:A P type semiconductor layer with boron concentration lower than a P<+> type monocrystal semiconductor substrate 26 is formed on the substrate 26 in Si containing boron in high concentration according to an epitaxial method. Boron is diffused in high concentration, and P<+> type low resistance regions 28 reaching the substrate 26 are made up, thus forming divided island-shaped regions 27, 29. The surface is coated with a Si nitride film, the nitride films of sections 31 are removed, a Si dioxide film 30 is built up and a gate electrode 23 in polycrystal Si is made up on the film 30. P ions are injected, and N type regions 20, 22, 24 are formed. Wiring 21 connecting the regions 20, 22 and wiring 25 reading signals are made up by polycrystal Si or metal with low resistance. Accordingly, the efficiency of conversion of the P-N junctions for receiving light is increased, and the generation of the blooming can be prevented.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7859680A JPS574173A (en) | 1980-06-10 | 1980-06-10 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7859680A JPS574173A (en) | 1980-06-10 | 1980-06-10 | Semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS574173A true JPS574173A (en) | 1982-01-09 |
Family
ID=13666279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7859680A Pending JPS574173A (en) | 1980-06-10 | 1980-06-10 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS574173A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60158679A (en) * | 1984-01-28 | 1985-08-20 | Rohm Co Ltd | Light receiving element |
| US4794443A (en) * | 1984-05-28 | 1988-12-27 | Canon Kabushiki Kaisha | Semiconductor device and process for producing same |
-
1980
- 1980-06-10 JP JP7859680A patent/JPS574173A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60158679A (en) * | 1984-01-28 | 1985-08-20 | Rohm Co Ltd | Light receiving element |
| US4794443A (en) * | 1984-05-28 | 1988-12-27 | Canon Kabushiki Kaisha | Semiconductor device and process for producing same |
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