JPS5765732A - Formation of diffused-reflection deposition pattern - Google Patents

Formation of diffused-reflection deposition pattern

Info

Publication number
JPS5765732A
JPS5765732A JP14095080A JP14095080A JPS5765732A JP S5765732 A JPS5765732 A JP S5765732A JP 14095080 A JP14095080 A JP 14095080A JP 14095080 A JP14095080 A JP 14095080A JP S5765732 A JPS5765732 A JP S5765732A
Authority
JP
Japan
Prior art keywords
sheet
film
pattern
layer
diffused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14095080A
Other languages
Japanese (ja)
Inventor
Sadami Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP14095080A priority Critical patent/JPS5765732A/en
Publication of JPS5765732A publication Critical patent/JPS5765732A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To foam a diffused-reflection deposition pattern without damaging burrier properties to gas and the like, by forming a vehicle pattern layer having a rough surface on one side of a sheet or film and then forming a metallized layer. CONSTITUTION:A transparent or opaque synthetic resin sheet or film 1 drawn out from a supply drum 2 is fed between a roller 7 and a printing cylinder 4 having a reticluate pattern engraved on the surface to coat one side of the film or sheet 1 with a vehicle in a vessel 6 which has good adhesion to the sheet 1, and thus a pattern layer 18a having a rough surface is formed on one side of the film or sheet 1. Thereafter, the film or sheet 1 is dried with a drying device 9 and then introduced into the vacuum deposition chamber 12 of a continuous vacuum deposition device 10. Subsequently, a metal in a crucible 14 is heated with a heater 13 to be evaporated and the evaporated metal is deposited on the sheet 1 to form a diffusedreflection metallized pattern 19b having minute irregularities on the surface of the ]attern layer 18a.
JP14095080A 1980-10-08 1980-10-08 Formation of diffused-reflection deposition pattern Pending JPS5765732A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14095080A JPS5765732A (en) 1980-10-08 1980-10-08 Formation of diffused-reflection deposition pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14095080A JPS5765732A (en) 1980-10-08 1980-10-08 Formation of diffused-reflection deposition pattern

Publications (1)

Publication Number Publication Date
JPS5765732A true JPS5765732A (en) 1982-04-21

Family

ID=15280576

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14095080A Pending JPS5765732A (en) 1980-10-08 1980-10-08 Formation of diffused-reflection deposition pattern

Country Status (1)

Country Link
JP (1) JPS5765732A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015172228A (en) * 2014-03-12 2015-10-01 グローブライド株式会社 Surface structure and method for manufacturing the surface structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015172228A (en) * 2014-03-12 2015-10-01 グローブライド株式会社 Surface structure and method for manufacturing the surface structure

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