JPS5773741A - Photomask - Google Patents

Photomask

Info

Publication number
JPS5773741A
JPS5773741A JP14895880A JP14895880A JPS5773741A JP S5773741 A JPS5773741 A JP S5773741A JP 14895880 A JP14895880 A JP 14895880A JP 14895880 A JP14895880 A JP 14895880A JP S5773741 A JPS5773741 A JP S5773741A
Authority
JP
Japan
Prior art keywords
layer
light shielding
photomask
chromium oxide
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14895880A
Other languages
English (en)
Other versions
JPS623415B2 (ja
Inventor
Teruo Kuno
Nobuhiro Hashimoto
Ryohei Oikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP14895880A priority Critical patent/JPS5773741A/ja
Publication of JPS5773741A publication Critical patent/JPS5773741A/ja
Publication of JPS623415B2 publication Critical patent/JPS623415B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/46—Antireflective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP14895880A 1980-10-24 1980-10-24 Photomask Granted JPS5773741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14895880A JPS5773741A (en) 1980-10-24 1980-10-24 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14895880A JPS5773741A (en) 1980-10-24 1980-10-24 Photomask

Publications (2)

Publication Number Publication Date
JPS5773741A true JPS5773741A (en) 1982-05-08
JPS623415B2 JPS623415B2 (ja) 1987-01-24

Family

ID=15464457

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14895880A Granted JPS5773741A (en) 1980-10-24 1980-10-24 Photomask

Country Status (1)

Country Link
JP (1) JPS5773741A (ja)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119353A (ja) * 1982-12-27 1984-07-10 Hoya Corp フオトマスクブランク
JPS61235819A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 液晶表示素子とその製造方法
JPS6229139A (ja) * 1985-07-31 1987-02-07 Hitachi Ltd パタ−ン転写用マスクおよび使用方法
JPS62293511A (ja) * 1986-06-12 1987-12-21 Sumitomo Special Metals Co Ltd 磁気記録媒体
US4758085A (en) * 1985-10-16 1988-07-19 Bertin & Cie Optical fiber spectrometer/colorimeter apparatus
CN115268202A (zh) * 2021-04-30 2022-11-01 Skc索密思株式会社 光掩模坯、光掩模及半导体器件的制造方法
JP2023088855A (ja) * 2021-12-15 2023-06-27 エスケー エンパルス カンパニー リミテッド ブランクマスク及びそれを用いたフォトマスク

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5323277A (en) * 1976-08-14 1978-03-03 Konishiroku Photo Ind Co Ltd Photomasking material and photomask

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59119353A (ja) * 1982-12-27 1984-07-10 Hoya Corp フオトマスクブランク
JPS61235819A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 液晶表示素子とその製造方法
JPS6229139A (ja) * 1985-07-31 1987-02-07 Hitachi Ltd パタ−ン転写用マスクおよび使用方法
US4758085A (en) * 1985-10-16 1988-07-19 Bertin & Cie Optical fiber spectrometer/colorimeter apparatus
JPS62293511A (ja) * 1986-06-12 1987-12-21 Sumitomo Special Metals Co Ltd 磁気記録媒体
CN115268202A (zh) * 2021-04-30 2022-11-01 Skc索密思株式会社 光掩模坯、光掩模及半导体器件的制造方法
US20220350238A1 (en) * 2021-04-30 2022-11-03 Skc Solmics Co., Ltd. Photomask blank, photomask, and manufacturing method of semiconductor element
JP2022171587A (ja) * 2021-04-30 2022-11-11 エスケーシー ソルミックス カンパニー，リミテッド フォトマスクブランク、フォトマスク及び半導体素子の製造方法
CN115268202B (zh) * 2021-04-30 2025-10-10 Sk恩普士有限公司 光掩模坯、光掩模及半导体器件的制造方法
JP2023088855A (ja) * 2021-12-15 2023-06-27 エスケー エンパルス カンパニー リミテッド ブランクマスク及びそれを用いたフォトマスク

Also Published As

Publication number Publication date
JPS623415B2 (ja) 1987-01-24

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