JPS5775439A - Judgement of stability of semiconductor device - Google Patents
Judgement of stability of semiconductor deviceInfo
- Publication number
- JPS5775439A JPS5775439A JP15147080A JP15147080A JPS5775439A JP S5775439 A JPS5775439 A JP S5775439A JP 15147080 A JP15147080 A JP 15147080A JP 15147080 A JP15147080 A JP 15147080A JP S5775439 A JPS5775439 A JP S5775439A
- Authority
- JP
- Japan
- Prior art keywords
- traps
- curve
- bias voltage
- voltage
- transfers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title abstract 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 230000001678 irradiating effect Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Electromagnetism (AREA)
- Toxicology (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To judge the stability of a semiconductor device from the quantity of variation of a flat band voltage by a method wherein the energy of carrier is enhanced by light, and the device is treated for the prescribed time in the room temperature applying a bias voltage. CONSTITUTION:The capacitance C-voltage V characteristic curve a of an MOS diode consisting of an Si substrate 5, an SiO2 film 6, electrodes 7 is obtained. Then a bias voltage is applied irradiating the MOS diode with a W lamp 9. Whe doner type traps exist in the insulating film 6, electrons are discharged from the traps carying positive electric charge by the application of a negative bias voltage, and C-V characteristic transfers in the negative direction as shown with the c curve. When a positive bias voltage is applied, the curve thereof transfers in the positive direction as shown with the b curve. Therefore the flat band voltage are obtained from respective C-V characteristics, and the unstable component owing to the traps can be measured from quantity of variation. At the neighborhood of the room temperature, almost no movable ion of Na<+>, etc. in the insulating film transfers, the unstable component owing to ions thereof can be separated, and only the unstable component owing to the traps can be measured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15147080A JPS5775439A (en) | 1980-10-30 | 1980-10-30 | Judgement of stability of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15147080A JPS5775439A (en) | 1980-10-30 | 1980-10-30 | Judgement of stability of semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5775439A true JPS5775439A (en) | 1982-05-12 |
Family
ID=15519217
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15147080A Pending JPS5775439A (en) | 1980-10-30 | 1980-10-30 | Judgement of stability of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5775439A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63151035A (en) * | 1986-12-16 | 1988-06-23 | Matsushita Electric Ind Co Ltd | Method for testing deterioration of semiconductor device |
| EP0704890A3 (en) * | 1994-09-30 | 1997-05-02 | Shinetsu Handotai Kk | Method for evaluating an MIS semiconductor device |
| JP2003273183A (en) * | 2002-03-15 | 2003-09-26 | Solid State Measurements Inc | High-speed measurement method of threshold voltage and dopant concentration |
| JP2021057584A (en) * | 2019-09-24 | 2021-04-08 | 東レ株式会社 | Capacitance-voltage characteristic measurement method and capacitance-voltage characteristic measurement device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54130882A (en) * | 1978-04-03 | 1979-10-11 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of inspecting semiconductor surface |
-
1980
- 1980-10-30 JP JP15147080A patent/JPS5775439A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54130882A (en) * | 1978-04-03 | 1979-10-11 | Cho Lsi Gijutsu Kenkyu Kumiai | Method of inspecting semiconductor surface |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63151035A (en) * | 1986-12-16 | 1988-06-23 | Matsushita Electric Ind Co Ltd | Method for testing deterioration of semiconductor device |
| EP0704890A3 (en) * | 1994-09-30 | 1997-05-02 | Shinetsu Handotai Kk | Method for evaluating an MIS semiconductor device |
| US5701088A (en) * | 1994-09-30 | 1997-12-23 | Shin-Etsu Handotai Co., Ltd | Method of evaluating a MIS-type semiconductor device |
| JP2003273183A (en) * | 2002-03-15 | 2003-09-26 | Solid State Measurements Inc | High-speed measurement method of threshold voltage and dopant concentration |
| JP2021057584A (en) * | 2019-09-24 | 2021-04-08 | 東レ株式会社 | Capacitance-voltage characteristic measurement method and capacitance-voltage characteristic measurement device |
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