JPS5776841A - Etching method of silicon oxide film - Google Patents

Etching method of silicon oxide film

Info

Publication number: JPS5776841A
Authority: JP; Japan
Prior art keywords: oxide film; silicon oxide; electrons; ion; ion gun
Prior art date: 1980-10-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP15260380A

Other languages

English (en)

Inventor

Yukinori Kuroki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NEC Corp

Original Assignee

NEC Corp

Nippon Electric Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1980-10-30

Filing date

1980-10-30

Publication date

1982-05-14

1980-10-30 Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp

1980-10-30 Priority to JP15260380A priority Critical patent/JPS5776841A/ja

1982-05-14 Publication of JPS5776841A publication Critical patent/JPS5776841A/ja

Status Pending legal-status Critical Current

Links

VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title abstract 7
229910052814 silicon oxide Inorganic materials 0.000 title abstract 6
238000005530 etching Methods 0.000 title abstract 2
238000000034 method Methods 0.000 title 1
150000002500 ions Chemical class 0.000 abstract 8
230000001678 irradiating effect Effects 0.000 abstract 2
125000001153 fluoro group Chemical group F* 0.000 abstract 1
238000003754 machining Methods 0.000 abstract 1
239000000463 material Substances 0.000 abstract 1
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 abstract 1
229910052753 mercury Inorganic materials 0.000 abstract 1
230000007935 neutral effect Effects 0.000 abstract 1
239000010453 quartz Substances 0.000 abstract 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Drying Of Semiconductors (AREA)

JP15260380A 1980-10-30 1980-10-30 Etching method of silicon oxide film Pending JPS5776841A (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP15260380A JPS5776841A (en)	1980-10-30	1980-10-30	Etching method of silicon oxide film

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP15260380A JPS5776841A (en)	1980-10-30	1980-10-30	Etching method of silicon oxide film

Publications (1)

Publication Number	Publication Date
JPS5776841A true JPS5776841A (en)	1982-05-14

Family

ID=15544011

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP15260380A Pending JPS5776841A (en)	1980-10-30	1980-10-30	Etching method of silicon oxide film

Country Status (1)

Country	Link
JP (1)	JPS5776841A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5966124A (ja) *	1982-10-08	1984-04-14	Hitachi Ltd	表面処理方法および装置
US4734158A (en) *	1987-03-16	1988-03-29	Hughes Aircraft Company	Molecular beam etching system and method

1980
- 1980-10-30 JP JP15260380A patent/JPS5776841A/ja active Pending

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS5966124A (ja) *	1982-10-08	1984-04-14	Hitachi Ltd	表面処理方法および装置
US4734158A (en) *	1987-03-16	1988-03-29	Hughes Aircraft Company	Molecular beam etching system and method

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