JPS5776845A - Method and apparatus for processing microwave plasma - Google Patents

Method and apparatus for processing microwave plasma

Info

Publication number
JPS5776845A
JPS5776845A JP15313280A JP15313280A JPS5776845A JP S5776845 A JPS5776845 A JP S5776845A JP 15313280 A JP15313280 A JP 15313280A JP 15313280 A JP15313280 A JP 15313280A JP S5776845 A JPS5776845 A JP S5776845A
Authority
JP
Japan
Prior art keywords
microwave
electrode
plasma
processing chamber
supply port
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15313280A
Other languages
Japanese (ja)
Inventor
Hiroshi Yano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15313280A priority Critical patent/JPS5776845A/en
Publication of JPS5776845A publication Critical patent/JPS5776845A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To enable etching without undercut to be performed by arranging an electrode at the upper part in a plasma processing chamber, applying a voltage to said electrode, and giving directivity to plasma particles generated by the microwave. CONSTITUTION:The plasma is generated at the upper part under a microwave supply port 35 ain a 1uartz processing chamber 31 in a microwave oven 31. In order to give the directivity to said plasma particles, the electrode 38 wihich e.g. comprises 0.1-1.0mm. and has a sufficient area for covering a table 36 is provided in the vicinity or the palsma forming region. In order to perform the etching treatment on a semiconductor wafer 37, the microwave power of e.g. 2.45GHz and 600W is supplied through the microwave supply port 35 from a microwave generator 35A. In the meantime, Freon gas CF2 (5% O2) is supplied from a gas supply port 33. The gas pressure in the processing chamber 32 is maintained at 0.01-0.1 Torr. A voltage of e.g. 200V is applied to the electrode 38.
JP15313280A 1980-10-31 1980-10-31 Method and apparatus for processing microwave plasma Pending JPS5776845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15313280A JPS5776845A (en) 1980-10-31 1980-10-31 Method and apparatus for processing microwave plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15313280A JPS5776845A (en) 1980-10-31 1980-10-31 Method and apparatus for processing microwave plasma

Publications (1)

Publication Number Publication Date
JPS5776845A true JPS5776845A (en) 1982-05-14

Family

ID=15555684

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15313280A Pending JPS5776845A (en) 1980-10-31 1980-10-31 Method and apparatus for processing microwave plasma

Country Status (1)

Country Link
JP (1) JPS5776845A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135730A (en) * 1983-01-24 1984-08-04 Hitachi Ltd surface modification equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112477A (en) * 1980-02-06 1981-09-04 Ulvac Corp Microwave plasma treating apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56112477A (en) * 1980-02-06 1981-09-04 Ulvac Corp Microwave plasma treating apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59135730A (en) * 1983-01-24 1984-08-04 Hitachi Ltd surface modification equipment

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